Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE38256 | Photosensitive composition | Naomi Shida, Takuya Naito, Koji Asakawa, Akinori Hongu, Makoto Nakase +1 more | 2003-09-23 |
| 6541597 | Resin useful for resist, resist composition and pattern forming process using the same | Takeshi Okino, Koji Asakawa, Naomi Shida, Satoshi Saito | 2003-04-01 |
| 6440636 | Polymeric compound and resin composition for photoresist | Takeshi Okino, Koji Asakawa, Naomi Shida, Yoshinori Funaki, Kiyoharu Tsutsumi +2 more | 2002-08-27 |
| 6410748 | Alicycli c group-containing monomer | Naomi Shida, Koji Asakawa, Takeshi Okino, Shuji Hayase, Yoshihiko Nakano +1 more | 2002-06-25 |
| 6303266 | Resin useful for resist, resist composition and pattern forming process using the same | Takeshi Okino, Koji Asakawa, Naomi Shida, Satoshi Saito | 2001-10-16 |
| 6291129 | Monomer, high molecular compound and photosensitive composition | Naomi Shida, Koji Asakawa, Takeshi Okino, Shuji Hayase, Yoshihiko Nakano +1 more | 2001-09-18 |
| 6280897 | Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts | Koji Asakawa, Naoko Kihara, Naomi Shida, Takeshi Okino, Makoto Nakase +2 more | 2001-08-28 |
| 6228552 | Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material | Takeshi Okino, Koji Asakawa, Naomi Shida, Makoto Nakase | 2001-05-08 |
| 6197473 | Photosensitive composition and a pattern forming process using the same | Naoko Kihara, Satoshi Saito | 2001-03-06 |
| 6190841 | Pattern forming process and a photosensitive composition | Naoko Kihara, Satoshi Saito | 2001-02-20 |
| 6177229 | Photosensitive composition | Satoshi Saito, Naoko Kihara | 2001-01-23 |
| 6168897 | Method of forming patterns | Makoto Nakase, Takuya Naito, Koji Asakawa | 2001-01-02 |
| 6071670 | Transparent resin, photosensitive composition, and method of forming a pattern | Takeshi Okino, Naomi Shida, Makoto Nakase, Yoshiaki Kawamonzen, Rumiko Hayase +1 more | 2000-06-06 |
| 6060207 | Photosensitive material | Naomi Shida, Takuya Naito, Makoto Nakase | 2000-05-09 |
| 6045968 | Photosensitive composition | Koji Asakawa, Makoto Nakase, Naomi Shida, Takeshi Okino | 2000-04-04 |
| 6025117 | Method of forming a pattern using polysilane | Yoshihiko Nakano, Rikako Kani, Shuji Hayase, Yasuhiko Sato, Seiro Miyoshi +5 more | 2000-02-15 |
| 5932391 | Resist for alkali development | Koji Asakawa, Naoko Kihara, Makoto Nakase, Naomi Shida, Takeshi Okino | 1999-08-03 |
| 5928841 | Method of photoetching at 180 to 220 | Makoto Nakase, Takuya Naito, Koji Asakawa | 1999-07-27 |
| 5853952 | Color developing organic material, color developing resin composition and colored thin film pattern | Makoto Nakase, Akira Yoshizumi, Naoko Kihara, Takuya Naito, Naomi Shida +1 more | 1998-12-29 |
| 5837419 | Photosensitive composition | Koji Asakawa, Makoto Nakase, Naomi Shida, Takeshi Okino | 1998-11-17 |
| 5691101 | Photosensitive composition | Naomi Shida, Takuya Naito, Koji Asakawa, Akinori Hongu, Makoto Nakase +1 more | 1997-11-25 |
| 5372914 | Pattern forming method | Takuya Naito, Osamu Sasaki, Tsukasa Tada, Naoko Kihara, Satoshi Saito +2 more | 1994-12-13 |
| 5348838 | Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group | Naoko Kihara, Osamu Sasaki, Tsukasa Tada, Takuya Naito, Satoshi Saito | 1994-09-20 |
| 5169740 | Positive type and negative type ionization irradiation sensitive and/or deep U.V. sensitive resists comprising a halogenated resin binder | Tsukasa Tada, Akitoshi Kumagae | 1992-12-08 |
| 5091282 | Alkali soluble phenol polymer photosensitive composition | Yasunobu Onishi, Hirokazu Niki, Yoshihito Kobayashi, Rumiko Hayase | 1992-02-25 |