TI

Takashi Ishigami

KT Kabushiki Kaisha Toshiba: 26 patents #1,029 of 21,451Top 5%
HI Hitachi: 20 patents #1,757 of 28,497Top 7%
NE Nec: 7 patents #2,006 of 14,502Top 15%
HS Hitachi Automotive Systems: 5 patents #333 of 1,636Top 25%
NE Nec Electronics: 3 patents #234 of 1,789Top 15%
KC Kokusan Denki Co.: 1 patents #62 of 128Top 50%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
TC Toshiba Materials Co.: 1 patents #127 of 197Top 65%
Overall (All Time): #34,830 of 4,157,543Top 1%
64
Patents All Time

Issued Patents All Time

Showing 26–50 of 64 patents

Patent #TitleCo-InventorsDate
RE41975 Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same Koichi Watanabe, Akihisa Nitta, Toshihiro Maki, Noriaki Yagi 2010-11-30
7825562 Rotary electric machine, crank-shaped continuously winding coil, distribution winding stator and forming method thereof Takashi Naganawa, Hiromichi Hiramatsu, Kenichi Nakayama, Tsuyoshi Goto, Yoshimi Mori +1 more 2010-11-02
7718117 Tungsten sputtering target and method of manufacturing the target Koichi Watanabe, Yoichiro Yabe, Takashi Watanabe, Hitoshi Aoyama, Yasuo Kohsaka +1 more 2010-05-18
7683516 Production method for rotating electric machine and stator coils, and electric power steering motor Masashi Kitamura, Osamu Koizumi, Mitsuaki Mirumachi 2010-03-23
7651941 Method of manufacturing a semiconductor device that includes forming a via hole through a reaction layer formed between a conductive barrier and a wiring 2010-01-26
7453179 DC brushless motor for electrical power steering and the production method thereof Toshiyuki Innami, Mitsuaki Mirumachi, Osamu Koizumi, Masamichi Yagai, Masashi Kitamura 2008-11-18
7242128 DC brushless motor for electrical power steering and the production method thereof Toshiyuki Innami, Mitsuaki Mirumachi, Osamu Koizumi, Masamichi Yagai, Masashi Kitamura 2007-07-10
7230337 Semiconductor device including ladder-shaped siloxane hydride and method for manufacturing same Tatsuya Usami, Tetsuya Kurokawa, Noriaki Oda 2007-06-12
7138700 Semiconductor device with guard ring for preventing water from entering circuit region from outside Ryuji Tomita, Tetsuya Kurokawa, Manabu Iguchi, Kazuyoshi Ueno, Makoto Sekine 2006-11-21
6929726 Sputtering target, Al interconnection film, and electronic component Koichi Watanabe 2005-08-16
6750542 Sputter target, barrier film and electronic component Yukinobu Suzuki, Yasuo Kohsaka, Naomi Fujioka, Takashi Watanabe, Koichi Watanabe +1 more 2004-06-15
6736947 Sputtering target, A1 interconnection film, and electronic component Koichi Watanabe 2004-05-18
6400025 Highly purified titanium material, method for preparation of it and sputtering target using it Mituo Kawai, Noriaki Yagi 2002-06-04
6372628 Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film, and a method for manufacturing the semiconductor device Yoshihisa Matsubara, Ko Noguchi, Shinya Ito, Noriaki Oda, Akira Matsumoto +5 more 2002-04-16
6329275 Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same Koichi Watanabe, Akihisa Nitta, Toshihiro Maki, Noriaki Yagi 2001-12-11
6241859 Method of forming a self-aligned refractory metal silicide layer Yoshiaki Yamada, Yoshihisa Matsubara 2001-06-05
6229241 Structure and manufacturing method for motor and stator Yukinori Taneda, Toshihiko Sakai, Hiromichi Hiramatsu, Noriaki Yamamoto, Yuji Enomoto +5 more 2001-05-08
6222296 Electric motor having a stator with an end core part having a different shape than a central core part Toshihiko Sakai, Yukinori Taneda, Hiromichi Hiramatsu, Noriaki Yamamoto, Yuji Enomoto +4 more 2001-04-24
6210634 Highly purified titanium material, method for preparation of it and sputtering target using it Mituo Kawai, Noriaki Yagi 2001-04-03
6165607 Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same Takashi Yamanobe, Naomi Fujioka, Nobuo Katsui, Hiromi Fuke, Kazuhiro Saito +3 more 2000-12-26
6127267 Fabrication method of semiconductor device equipped with silicide layer Yoshihisa Matsubara, Yoshiaki Yamada, Shinichi Watanuki 2000-10-03
6097094 Semiconductor device having wiring layers and method of fabricating the same 2000-08-01
6091081 Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film Yoshihisa Matsubara, Ko Noguchi, Shinya Ito, Noriaki Oda, Akira Matsumoto +5 more 2000-07-18
6033536 Magnetron sputtering method and sputtering target Katsutaro Ichihara, Kohichi Tateyama, Ryo Sakai 2000-03-07
5686980 Light-shielding film, useable in an LCD, in which fine particles of a metal or semi-metal are dispersed in and throughout an inorganic insulating film Hideo Hirayama, Nobuki Ibaraki, Koji Hidaka, Kiyotsugu Mizouchi, Michiya Kobayashi +2 more 1997-11-11