TY

Takashi Yamanobe

KT Kabushiki Kaisha Toshiba: 13 patents #2,297 of 21,451Top 15%
MK Meiji Seika Kaisha: 3 patents #166 of 752Top 25%
MI Ministry Of International Trade & Industry: 2 patents #91 of 582Top 20%
AT Agency Of Industrial Science And Technology: 2 patents #293 of 1,778Top 20%
OC Oji Yuka Goseishi Co.: 1 patents #14 of 35Top 40%
📍 Ibaraki, JP: #397 of 6,779 inventorsTop 6%
Overall (All Time): #225,179 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
7988786 Carbon film coated member Michio Sato 2011-08-02
7256031 Enzyme having β-glucosidase activity and use thereof Tomoyuki Fukasawa, Chuhei Nojiri, Nobuo Matsuhashi, Koji Nishizawa, Kaoru Okakura 2007-08-14
6352628 Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device Michio Sato, Tohru Komatsu, Yoshiharu Fukasawa, Noriaki Yagi, Toshihiro Maki +1 more 2002-03-05
6309593 Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device Michio Sato, Tohru Komatsu, Yoshiharu Fukasawa, Noriaki Yagi, Toshihiro Maki +1 more 2001-10-30
6165607 Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same Naomi Fujioka, Takashi Ishigami, Nobuo Katsui, Hiromi Fuke, Kazuhiro Saito +3 more 2000-12-26
6140097 Mesophilic xylanases Gentaro Okada, Takanori Nihira, Shoji Gotoh, Masako Mizuno, Toshiaki Kono 2000-10-31
6127160 Protein having cellulase activities and process for producing the same Manabu Watanabe, Toru Hamaya, Naomi Sumida, Kaoru Aoyagi, Takeshi Murakami 2000-10-03
5733427 Sputtering target and method of manufacturing the same Michio Satou, Mitsuo Kawai, Tatsuzo Kawaguchi, Kazuhiko Mitsuhashi, Toshiaki Mizutani 1998-03-31
5679983 Highly purified metal material and sputtering target using the same Takashi Ishigami, Minoru Obata, Mituo Kawai, Michio Satou, Toshihiro Maki +2 more 1997-10-21
5470527 Ti-W sputtering target and method for manufacturing same Michio Satou, Takashi Ishigami, Minoru Obata, Mituo Kawai, Noriaki Yagi +2 more 1995-11-28
5458697 Highly purified metal material and sputtering target using the same Takashi Ishigami, Minoru Obata, Mituo Kawai, Michio Satou, Toshihiro Maki +2 more 1995-10-17
5447616 Sputtering target Michio Satou, Mitsuo Kawai, Tatsuzo Kawaguchi, Kazuhiko Mitsuhashi, Toshiaki Mizutani 1995-09-05
5418071 Sputtering target and method of manufacturing the same Michio Satou, Takashi Ishigami, Mituo Kawai, Noriaki Yagi, Toshihiro Maki +2 more 1995-05-23
5332542 Process for producing labeled hollow container Masaaki Yamanaka 1994-07-26
5294321 Sputtering target Michio Satou, Mitsuo Kawai, Tatsuzo Kawaguchi, Kazuhiko Mitsuhashi, Toshiaki Mizutani 1994-03-15
5196916 Highly purified metal material and sputtering target using the same Takashi Ishigami, Minoru Obata, Mituo Kawai, Michio Satou, Toshihiro Maki +2 more 1993-03-23
4956291 Method for production of cellulolytic enzymes and method for saccharification of cellulosic materials therewith Yasushi Mitsuishi, Yoshiyuki Takasaki 1990-09-11
4842706 Sputtering target Yoshiharu Fukasawa, Mituo Kawai, Hideo Ishihara 1989-06-27
4742005 Method for production of cellulolytic enzymes and method for saccharification of cellulosic materials therewith Yasushi Mitsuishi, Yoshiyuki Takasaki 1988-05-03
4562150 Method for manufacture of cellulase Yasushi Mitsuishi, Yoshiyuki Takasaki 1985-12-31