Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7153589 | Mo-W material for formation of wiring, Mo-W target and method for production thereof, and Mo-W wiring thin film | Yasuo Kohsaka, Yoshiko Tsuji, Mitsushi Ikeda, Michio Sato, Toshihiro Maki | 2006-12-26 |
| 6352628 | Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device | Michio Sato, Takashi Yamanobe, Tohru Komatsu, Noriaki Yagi, Toshihiro Maki +1 more | 2002-03-05 |
| 6309593 | Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device | Michio Sato, Takashi Yamanobe, Tohru Komatsu, Noriaki Yagi, Toshihiro Maki +1 more | 2001-10-30 |
| 6200694 | Mo-W material for formation of wiring, Mo-W target and method for production thereof, and Mo-W wiring thin film | Yasuo Kohsaka, Yoshiko Tsuji, Mitsushi Ikeda, Michio Sato, Toshihiro Maki | 2001-03-13 |
| 5913100 | Mo-W material for formation of wiring, Mo-W target and method for production thereof, and Mo-W wiring thin film | Yasuo Kohsaka, Yoshiko Tsuji, Mitsushi Ikeda, Michio Sato, Toshihiro Maki | 1999-06-15 |
| 5512155 | Film forming apparatus | — | 1996-04-30 |
| 5190630 | Sputtering target | Makoto Kikuchi, Hideo Ishihara | 1993-03-02 |
| 4966676 | Sputtering target | Satoshi Yamaguchi, Hideo Ishihara | 1990-10-30 |
| 4963240 | Sputtering alloy target and method of producing an alloy film | Mituo Kawai, Hideo Ishihara, Takenori Umeki, Yasuhisa Oana | 1990-10-16 |
| 4842706 | Sputtering target | Mituo Kawai, Hideo Ishihara, Takashi Yamanobe | 1989-06-27 |
| 4514234 | Molybdenum board and process of manufacturing the same | Tatsuhiko Matsumoto, Mituo Kawai, Shigeru Ueda, Hideo Koizumi, Hiroyuki Saitou | 1985-04-30 |