NY

Noriaki Yagi

KT Kabushiki Kaisha Toshiba: 39 patents #530 of 21,451Top 3%
TC Toshiba Materials Co.: 5 patents #55 of 197Top 30%
TC Toshiba Silicone Co.: 5 patents #19 of 169Top 15%
SC Seoul Semiconductor Co.: 4 patents #99 of 277Top 40%
JC Japan Field Co.: 2 patents #4 of 6Top 70%
Overall (All Time): #58,066 of 4,157,543Top 2%
48
Patents All Time

Issued Patents All Time

Showing 1–25 of 48 patents

Patent #TitleCo-InventorsDate
12072069 Method for using white light source, and white light source Masahiko Yamakawa, Kumpei Kobayashi, Ryoji Tsuda, Kiyoshi Inoue, Kyung Hee Ye 2024-08-27
11978726 White light source system Masahiko Yamakawa, Kumpei Kobayashi 2024-05-07
11721675 White light source system Masahiko Yamakawa, Kumpei Kobayashi 2023-08-08
11430771 White light source system Masahiko Yamakawa, Kumpei Kobayashi 2022-08-30
11094679 White light source system Masahiko Yamakawa, Kumpei Kobayashi 2021-08-17
10674577 White light source system Masahiko Yamakawa, Kumpei Kobayashi 2020-06-02
10420183 White light source and white light source system Masahiko Yamakawa, Kumpei Kobayashi 2019-09-17
10375786 White light source system Masahiko Yamakawa, Kumpei Kobayashi 2019-08-06
10231305 White light source system Masahiko Yamakawa, Kumpei Kobayashi 2019-03-12
RE45481 Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same Takashi Ishigami, Koichi Watanabe, Akihisa Nitta, Toshihiro Maki 2015-04-21
RE41975 Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same Takashi Ishigami, Koichi Watanabe, Akihisa Nitta, Toshihiro Maki 2010-11-30
6400025 Highly purified titanium material, method for preparation of it and sputtering target using it Takashi Ishigami, Mituo Kawai 2002-06-04
6352628 Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device Michio Sato, Takashi Yamanobe, Tohru Komatsu, Yoshiharu Fukasawa, Toshihiro Maki +1 more 2002-03-05
6329275 Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same Takashi Ishigami, Koichi Watanabe, Akihisa Nitta, Toshihiro Maki 2001-12-11
6309593 Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device Michio Sato, Takashi Yamanobe, Tohru Komatsu, Yoshiharu Fukasawa, Toshihiro Maki +1 more 2001-10-30
6210634 Highly purified titanium material, method for preparation of it and sputtering target using it Takashi Ishigami, Mituo Kawai 2001-04-03
6136766 Cleaning compositions Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Nobuhiro Saitoh +2 more 2000-10-24
5985810 Cleaning compositions Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Nobuhiro Saitoh +2 more 1999-11-16
5977040 Cleaning compositions Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Nobuhiro Saitoh +2 more 1999-11-02
5888312 Cleaning method Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Nobuhiro Saitoh 1999-03-30
5843372 Hydrogen-absorbing alloy for battery, method of manufacturing the same, and secondary nickel-metal hydride battery Hiroyuki Hasebe, Shusuke Inada, Yoshiyuki Isozaki, Takamichi Inaba, Takao Sawa +3 more 1998-12-01
5833761 Method of cleaning an object including a cleaning step and a vapor drying step Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Nobuhiro Saitoh 1998-11-10
5772781 Method for cleaning an object using an agent that includes a polyorganosiloxane or isoparaffin Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Nobuhiro Saitoh 1998-06-30
5769962 Cleaning method Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Nobuhiro Saitoh 1998-06-23
5741365 Continuous method for cleaning industrial parts using a polyorganosiloxane Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Nobuhiro Saitoh +2 more 1998-04-21