TM

Toshihiro Maki

KT Kabushiki Kaisha Toshiba: 13 patents #2,297 of 21,451Top 15%
YA Yazaki: 13 patents #327 of 3,427Top 10%
📍 Shizuoka, MI: #5 of 14 inventorsTop 40%
Overall (All Time): #155,378 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 1–25 of 26 patents

Patent #TitleCo-InventorsDate
RE45481 Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same Takashi Ishigami, Koichi Watanabe, Akihisa Nitta, Noriaki Yagi 2015-04-21
RE41975 Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same Takashi Ishigami, Koichi Watanabe, Akihisa Nitta, Noriaki Yagi 2010-11-30
7153589 Mo-W material for formation of wiring, Mo-W target and method for production thereof, and Mo-W wiring thin film Yasuo Kohsaka, Yoshiharu Fukasawa, Yoshiko Tsuji, Mitsushi Ikeda, Michio Sato 2006-12-26
6976889 Method and structure for connecting a terminal with a wire Yasumichi Kuwayama, Masanori Onuma, Nobuyuki Asakura 2005-12-20
6893301 Method and structure for connecting a terminal with a wire Yasumichi Kuwayama, Masanori Onuma, Nobuyuki Asakura 2005-05-17
6770817 Structure for waterproofing terminal-wire connecting portion and method of waterproofing the same Yasumichi Kuwayama 2004-08-03
6749457 Crimp terminal Tadahisa Sakaguchi 2004-06-15
6739899 Method and structure for connecting a terminal with a wire Yasumichi Kuwayama, Masanori Onuma, Nobuyuki Asakura 2004-05-25
6734359 Wire connecting structure and connecting method Hisashi Hanazaki, Takashi Ishii 2004-05-11
6625884 Method of determining a connection state of metal terminal and a wire Yoshihiro Fukase 2003-09-30
6626711 Press-clamping terminal and method of examining press-clamped condition thereof Hironori Kitagawa, Naoki Ito, Tsutomu Takayama 2003-09-30
6352628 Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device Michio Sato, Takashi Yamanobe, Tohru Komatsu, Yoshiharu Fukasawa, Noriaki Yagi +1 more 2002-03-05
6329275 Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same Takashi Ishigami, Koichi Watanabe, Akihisa Nitta, Noriaki Yagi 2001-12-11
6309593 Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device Michio Sato, Takashi Yamanobe, Tohru Komatsu, Yoshiharu Fukasawa, Noriaki Yagi +1 more 2001-10-30
6200694 Mo-W material for formation of wiring, Mo-W target and method for production thereof, and Mo-W wiring thin film Yasuo Kohsaka, Yoshiharu Fukasawa, Yoshiko Tsuji, Mitsushi Ikeda, Michio Sato 2001-03-13
6113441 Metal terminal and wire connector Yoshihiro Fukase 2000-09-05
5913100 Mo-W material for formation of wiring, Mo-W target and method for production thereof, and Mo-W wiring thin film Yasuo Kohsaka, Yoshiharu Fukasawa, Yoshiko Tsuji, Mitsushi Ikeda, Michio Sato 1999-06-15
5679983 Highly purified metal material and sputtering target using the same Takashi Ishigami, Minoru Obata, Mituo Kawai, Michio Satou, Takashi Yamanobe +2 more 1997-10-21
5634825 Electrical terminal 1997-06-03
5470527 Ti-W sputtering target and method for manufacturing same Takashi Yamanobe, Michio Satou, Takashi Ishigami, Minoru Obata, Mituo Kawai +2 more 1995-11-28
5458697 Highly purified metal material and sputtering target using the same Takashi Ishigami, Minoru Obata, Mituo Kawai, Michio Satou, Takashi Yamanobe +2 more 1995-10-17
5418071 Sputtering target and method of manufacturing the same Michio Satou, Takashi Yamanobe, Takashi Ishigami, Mituo Kawai, Noriaki Yagi +2 more 1995-05-23
5196916 Highly purified metal material and sputtering target using the same Takashi Ishigami, Minoru Obata, Mituo Kawai, Michio Satou, Takashi Yamanobe +2 more 1993-03-23
D324205 Connector housing Mark Grant 1992-02-25
D316703 Housing for an electrical connector Hidenori Eto, Yukio Ohta, Toru Matsunaga 1991-05-07