NK

Naoko Kihara

KT Kabushiki Kaisha Toshiba: 42 patents #460 of 21,451Top 3%
TC Toshiba Chemical: 2 patents #3 of 22Top 15%
Toshiba Memory: 2 patents #853 of 1,971Top 45%
Kioxia: 1 patents #1,054 of 1,813Top 60%
SK Showa Denko K.K.: 1 patents #940 of 1,736Top 55%
Overall (All Time): #65,350 of 4,157,543Top 2%
45
Patents All Time

Issued Patents All Time

Showing 26–45 of 45 patents

Patent #TitleCo-InventorsDate
6879099 Organic EL element and organic EL display Yasushi Mori, Katsuyuki Naito 2005-04-12
6811897 Ink for forming a hole injection layer of organic EL display devices and manufacturing method thereof, organic EL display devices, and manufacturing method of the same Katsuyuki Naito, Rei Hasegawa, Shintaro Enomoto, Yutaka Nakai, Kazushige Yamamoto +3 more 2004-11-02
6340552 Photosensitive composition containing a dissolution inhibitor and an acid releasing compound Fumihiko Yuasa, Tohru Ushirogouchi, Tsukasa Tada, Osamu Sasaki, Takuya Naito +1 more 2002-01-22
6306553 Photosensitive composition and method of forming a pattern using the same Fumihiko Yuasa, Tohru Ushirogouchi, Tsukasa Tada, Osamu Sasaki, Takuya Naito +1 more 2001-10-23
6280897 Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Takeshi Okino, Makoto Nakase +2 more 2001-08-28
6197473 Photosensitive composition and a pattern forming process using the same Satoshi Saito, Toru Ushirogouchi 2001-03-06
6190841 Pattern forming process and a photosensitive composition Satoshi Saito, Toru Ushirogouchi 2001-02-20
6177229 Photosensitive composition Satoshi Saito, Toru Ushirogouchi 2001-01-23
5932391 Resist for alkali development Toru Ushirogouchi, Koji Asakawa, Makoto Nakase, Naomi Shida, Takeshi Okino 1999-08-03
5853952 Color developing organic material, color developing resin composition and colored thin film pattern Toru Ushirogouchi, Makoto Nakase, Akira Yoshizumi, Takuya Naito, Naomi Shida +1 more 1998-12-29
5756254 Resist, method of forming a resist pattern and manufacturing an electronic parts using the resist Satoshi Saito, Hiromitsu Wakabayashi, Makoto Nakase, Masayuki Oba 1998-05-26
5518864 Method of forming polyimide film pattern Masayuki Oba, Rumiko Hayase, Shuzi Hayase, Yukihiro Mikogami, Yoshihiko Nakano +3 more 1996-05-21
5372914 Pattern forming method Takuya Naito, Osamu Sasaki, Tsukasa Tada, Toru Ushirogouchi, Satoshi Saito +2 more 1994-12-13
5348838 Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group Toru Ushirogouchi, Osamu Sasaki, Tsukasa Tada, Takuya Naito, Satoshi Saito 1994-09-20
5348835 Photosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agent Masayuki Oba, Rumiko Hayase, Shuzi Hayase, Yukihiro Mikogami, Yoshihiko Nakano +3 more 1994-09-20
5340684 Photosensitive composition and resin-encapsulated semiconductor device Rumiko Hayase, Masayuki Oba, Yukihiro Mikogami 1994-08-23
5332648 Potosensitive composition and method of forming a pattern using the same Fumihiko Yuasa, Tohru Ushirogouchi, Tsukasa Tada, Osamu Sasaki, Takuya Naito +1 more 1994-07-26
5216077 Rubber-modified phenolic resin composition and method of manufacturing the same Akira Yoshizumi, Shinetsu Fujieda, Ken Uchida, Kazuhiro Sawai, Tsutomu Nagata +2 more 1993-06-01
5068267 Semiconductor device encapsulant consisting of epoxy resin composition Ken Uchida, Michiya Higashi, Hiroshi Shimozawa, Akira Yoshizumo 1991-11-26
4916174 Rubber-modified phenolic resin composition and method of manufacturing the same Akira Yoshizumi, Shinetsu Fujieda, Ken Uchida, Kazuhiro Sawai, Tsutomu Nagata +2 more 1990-04-10