Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7432021 | Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle | Takashi Sato, Hideki Kanai | 2008-10-07 |
| 7396621 | Exposure control method and method of manufacturing a semiconductor device | Tadahito Fujisawa, Soichi Inoue, Satoshi Tanaka | 2008-07-08 |
| 7250235 | Focus monitor method and mask | Kyoko Izuha, Tadahito Fujisawa | 2007-07-31 |
| 7184913 | Testing system, a computer implemented testing method and a method for manufacturing electronic devices | — | 2007-02-27 |
| 7175943 | Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device | Tadahito Fujisawa, Satoshi Tanaka | 2007-02-13 |
| 7103503 | Testing system, a computer implemented testing method and a method for manufacturing electronic devices | — | 2006-09-05 |
| 6919153 | Dose monitoring method and manufacturing method of semiconductor device | Tadahito Fujisawa, Soichi Inoue, Takashi Sato | 2005-07-19 |
| 6866976 | Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit | Nobuhiro Komine, Soichi Inoue | 2005-03-15 |
| 6813001 | Exposure method and apparatus | Tadahito Fujisawa, Tatsuhiko Higashiki | 2004-11-02 |
| 6741334 | Exposure method, exposure system and recording medium | Tadahito Fujisawa, Kyoko Izuha | 2004-05-25 |
| 6701512 | Focus monitoring method, exposure apparatus, and exposure mask | Takumichi Sutani, Tadahito Fujisawa, Takashi Sato, Takashi Sakamoto, Soichi Inoue | 2004-03-02 |
| 6667139 | Method of manufacturing semiconductor device | Tadahito Fujisawa, Kyoko Izuha | 2003-12-23 |
| 5754526 | Channel switching method and channel switching controller | Hirokazu Kaneko, Masahiro Ueno, Yasuo Hirota, Wataru Kikuchi, Rikiya Okamoto +4 more | 1998-05-19 |
| 4339340 | Surface-treating agent adapted for intermediate products of a semiconductor device | Hisashi Muraoka, Taizo Ohashi, Yuzo Shimazaki | 1982-07-13 |
| 4239661 | Surface-treating agent adapted for intermediate products of a semiconductor device | Hisashi Muraoka, Taizo Ohashi, Yuzo Shimazaki | 1980-12-16 |