| 6896927 |
Method of preventing organic contamination from the atmosphere of electronic device substrates and electronic device substrates treated therewith |
— |
2005-05-24 |
| 6851873 |
Method and apparatus for removing organic films |
Rieko Muraoka, Asuka Sato, Mitsuru Endo |
2005-02-08 |
| 6699330 |
Method of removing contamination adhered to surfaces and apparatus used therefor |
— |
2004-03-02 |
| 6696228 |
Method and apparatus for removing organic films |
Rieko Muraoka, Asuka Sato, Mitsuru Endo |
2004-02-24 |
| 6059887 |
Process for cleaning the interior of semiconductor substrate |
Hiroshi Tomita, Soichi Nadahara, Norio Kobayashi |
2000-05-09 |
| 6054373 |
Method of and apparatus for removing metallic impurities diffused in a semiconductor substrate |
Hiroshi Tomita, Ryuji Takeda |
2000-04-25 |
| 5772738 |
Multifunctional air filter and air-circulating clean unit with the same incorporated therein |
— |
1998-06-30 |
| 5681398 |
Silicone wafer cleaning method |
— |
1997-10-28 |
| 5643404 |
Method for examination of silicon wafer surface defects |
Yuji Fukazawa |
1997-07-01 |
| 5636256 |
Apparatus used for total reflection fluorescent X-ray analysis on a liquid drop-like sample containing very small amounts of impurities |
Tuyoshi Matumura, Kunihiro Miyazaki |
1997-06-03 |
| 5635463 |
Silicon wafer cleaning fluid with HN0.sub.3, HF, HCl, surfactant, and water |
— |
1997-06-03 |
| 5350489 |
Treatment method of cleaning surface of plastic molded item |
— |
1994-09-27 |
| 5290361 |
Surface treating cleaning method |
Ichiro Hayashida, Masahiko Kakizawa, Kenichi Umekita, Hiroyoshi Nawa |
1994-03-01 |
| 5284802 |
Container for semiconductor wafer sample and method of preparing sample |
Takeyoshi Kakizaki |
1994-02-08 |
| 4587928 |
Apparatus for producing a semiconductor device |
Toshio Yonezawa |
1986-05-13 |
| 4515755 |
Apparatus for producing a silicon single crystal from a silicon melt |
Shuitsu Matsuo, Yasuhiro Imanishi, Hideo Nagashima, Masaharu Watanabe, Toshiro Usami |
1985-05-07 |
| 4339340 |
Surface-treating agent adapted for intermediate products of a semiconductor device |
Masafumi Asano, Taizo Ohashi, Yuzo Shimazaki |
1982-07-13 |
| 4239661 |
Surface-treating agent adapted for intermediate products of a semiconductor device |
Masafumi Asano, Taizo Ohashi, Yuzo Shimazaki |
1980-12-16 |