AS

Akira Sekiya

NC Nippon Zeon Co.: 5 patents #73 of 609Top 15%
HE Hitachi Kokusai Electric: 5 patents #177 of 843Top 25%
KC Kanto Denka Kogyo Co.: 5 patents #7 of 140Top 5%
UL Ulvac: 4 patents #97 of 680Top 15%
AC Asahi Glass Co.: 4 patents #490 of 2,251Top 25%
SO Sony: 4 patents #8,966 of 25,231Top 40%
SC Sanyo Electric Co.: 4 patents #1,493 of 6,347Top 25%
TL Tokyo Electron Limited: 3 patents #2,069 of 5,567Top 40%
DI Daikin Industries: 3 patents #994 of 2,957Top 35%
RE Renesas Electronics: 2 patents #1,855 of 4,529Top 45%
AN Anelva: 2 patents #81 of 280Top 30%
RT Renesas Technology: 2 patents #1,374 of 3,337Top 45%
Sumitomo Electric Industries: 2 patents #9,741 of 21,551Top 50%
Canon: 2 patents #12,681 of 19,416Top 70%
SD Showa Denko: 1 patents #231 of 593Top 40%
SK Showa Denko K.K.: 1 patents #940 of 1,736Top 55%
PA Panasonic: 1 patents #13,264 of 21,108Top 65%
AT Agency Of Industrial Science And Technology: 1 patents #568 of 1,778Top 35%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
FL Fujitsu Semiconductor Limited: 1 patents #612 of 1,301Top 50%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
NE Nec Electronics: 1 patents #715 of 1,789Top 40%
📍 Tsukuba, JP: #152 of 2,818 inventorsTop 6%
Overall (All Time): #224,776 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
8513458 Process for production of carbonyl fluoride Heng-dao Quan, Masanori Tamura 2013-08-20
8277560 CVD apparatus and method of cleaning the CVD apparatus Katsuo Sakai, Seiji Okura, Masaji Sakamura, Kaoru Abe, Hitoshi Murata +5 more 2012-10-02
8043438 Device for cleaning CVD device and method of cleaning CVD device Katsuo Sakai, Kaoru Abe, Seiji Okura, Masaji Sakamura, Hitoshi Murata +2 more 2011-10-25
7332628 Process for producing carbonyl fluoride Yuki Mitsui, Taisuke Yonemura, Yutaka Ohira 2008-02-19
7326279 Method for removing harmful substance in vent gas Yasuo Nakazawa, Moriyuki Fukushima, Kensuke Suda 2008-02-05
7322368 Plasma cleaning gas and plasma cleaning method Yuki Mitsui, Yutaka Ohira, Taisuke Yonemura 2008-01-29
7247289 Porous aluminum fluoride Hengdao Quan, Masanori Tamura 2007-07-24
7138364 Cleaning gas and etching gas Yutaka Ohira, Yuki Mitsui, Taisuke Yonemura 2006-11-21
6787053 Cleaning gases and etching gases Yuki Mitsui, Ginjiro Tomizawa, Katsuya Fukae, Yutaka Ohira, Taisuke Yonemura 2004-09-07
6514425 Dry etching gas Tetsuya Takagaki, Shinsuke Morikawa, Shunichi Yamashita, Tsuyoshi Takaichi, Yasuo Hibino +3 more 2003-02-04
6403846 Fluorinated, saturated hydrocarbons Toshirou Yamada, Takashi Uruma, Tatsuya Sugimoto 2002-06-11
6383403 Dry etching method Toshiro Yamada, Kuniaki Goto, Tetsuya Takagaki 2002-05-07
6322715 Gas composition for dry etching and process of dry etching Toshiro Yamada, Kuniaki Goto, Tetsuya Takagaki 2001-11-27
6211420 Process for the preparation of fluorinated olefin Toshiro Yamada, Mitsuru Sugawara 2001-04-03
5847243 Process for producing fluorinated alkene and fluorinated alkane Toshiro Yamada, Kazunori Watanabe 1998-12-08
5302764 Process for preparing trifluorohydrocarbon compound Shigeru Kurosawa, Toshiro Yamada, Kuniaki Goto 1994-04-12
5071915 Fluorine-containing polymeric compound and a method for the preparation thereof Masanori Tamura, Hiroyasu Ishida 1991-12-10
5001198 Fluorine-containing polymeric compound and a method for the preparation thereof Masanori Tamura, Hiroyasu Ishida 1991-03-19
4997886 Fluorine-containing polymeric compound and method for the preparation thereof Masanori Tamura 1991-03-05
4822860 Fluorine-containing polymeric amine-amide compound and a method for the preparation thereof 1989-04-18