TY

Taisuke Yonemura

KC Kanto Denka Kogyo Co.: 5 patents #7 of 140Top 5%
HE Hitachi Kokusai Electric: 4 patents #206 of 843Top 25%
DI Daikin Industries: 3 patents #994 of 2,957Top 35%
SO Sony: 3 patents #10,744 of 25,231Top 45%
UL Ulvac: 3 patents #134 of 680Top 20%
SC Sanyo Electric Co.: 3 patents #1,910 of 6,347Top 35%
AC Asahi Glass Co.: 3 patents #625 of 2,251Top 30%
RT Renesas Technology: 2 patents #1,374 of 3,337Top 45%
AN Anelva: 2 patents #81 of 280Top 30%
Sumitomo Electric Industries: 2 patents #9,741 of 21,551Top 50%
TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
SD Showa Denko: 1 patents #231 of 593Top 40%
SK Showa Denko K.K.: 1 patents #940 of 1,736Top 55%
PA Panasonic: 1 patents #13,264 of 21,108Top 65%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
Canon: 1 patents #14,899 of 19,416Top 80%
NE Nec Electronics: 1 patents #715 of 1,789Top 40%
Overall (All Time): #864,113 of 4,157,543Top 25%
6
Patents All Time

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
8277560 CVD apparatus and method of cleaning the CVD apparatus Katsuo Sakai, Seiji Okura, Masaji Sakamura, Kaoru Abe, Hitoshi Murata +5 more 2012-10-02
7919141 Processes and equipments for preparing F2-containing gases, as well as process and equipments for modifying the surfaces of articles Takashi Tanioka, Katsuya Fukae 2011-04-05
7332628 Process for producing carbonyl fluoride Yuki Mitsui, Yutaka Ohira, Akira Sekiya 2008-02-19
7322368 Plasma cleaning gas and plasma cleaning method Akira Sekiya, Yuki Mitsui, Yutaka Ohira 2008-01-29
7138364 Cleaning gas and etching gas Yutaka Ohira, Yuki Mitsui, Akira Sekiya 2006-11-21
6787053 Cleaning gases and etching gases Akira Sekiya, Yuki Mitsui, Ginjiro Tomizawa, Katsuya Fukae, Yutaka Ohira 2004-09-07