Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8624329 | Spacer-less low-K dielectric processes | Yong Meng Lee, Young Way Teh, Chung Woh Lai, Wenhe Lin, Khee Yong Lim +3 more | 2014-01-07 |
| 7999325 | Method to remove spacer after salicidation to enhance contact etch stop liner stress on MOS | Young Way Teh, Yong Meng Lee, Chung Woh Lai, Wenhe Lin, Khee Yong Lim +3 more | 2011-08-16 |
| 7615427 | Spacer-less low-k dielectric processes | Yong Meng Lee, Young Way Teh, Chung Woh Lai, Wenhe Lin, Khee Yong Lim +3 more | 2009-11-10 |
| 7445978 | Method to remove spacer after salicidation to enhance contact etch stop liner stress on MOS | Young Way Teh, Yong Meng Lee, Chung Woh Lai, Wenhe Lin, Khee Yong Lim +3 more | 2008-11-04 |
| 7256084 | Composite stress spacer | Khee Yong Lim, Wenhe Lin, Chung Woh Lai, Yong Meng Lee, Liang-Choo Hsia +3 more | 2007-08-14 |
| 6339021 | Methods for effective nickel silicide formation | Kin Leong Pey, Simon Chooi | 2002-01-15 |