RJ

Rik Jonckheere

IM Imec: 3 patents #122 of 687Top 20%
IV Imec Vzw: 2 patents #272 of 1,046Top 30%
IC Imec Usa Nanoelectronics Design Center: 1 patents #8 of 14Top 60%
IV Interuniversitair Micro-Electronica Centrum Vzw: 1 patents #167 of 450Top 40%
Samsung: 1 patents #49,284 of 75,807Top 70%
Overall (All Time): #836,695 of 4,157,543Top 25%
6
Patents All Time

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
10359694 Lithographic mask for EUV lithography Koen D'have 2019-07-23
10353284 Lithographic reticle system Cedric Huyghebaert, Emily Gallagher 2019-07-16
9086638 Detection of contamination in EUV systems Anne-Marie Goethals, Gian Francesco Lorusso, Ivan Pollentier 2015-07-21
8006202 Systems and methods for UV lithography Gian Francesco Lorusso, In-Sung Kim, Byeong-Soo Kim, Anne-Marie Goethals, Jan Hermans 2011-08-23
7750319 Method and system for measuring contamination of a lithographical element Gian Francesco Lorusso, Anne-Marie Goethals, Jan Hermans 2010-07-06
5624773 Resolution-enhancing optical phase structure for a projection illumination system Rainer Pforr, Kurt G. M. Ronse, Luc M. M. L. Van Den Hove 1997-04-29