Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12104087 | Composition for chemical-mechanical polishing and chemical-mechanical polishing method | Yuuya Yamada, Pengyu Wang, Yasutaka Kamei | 2024-10-01 |
| 8980529 | Radiation-sensitive resin composition, polymer, and resist pattern-forming method | Yasuhiko Matsuda, Tomohiro Kakizawa, Takakazu Kimoto | 2015-03-17 |
| 8895229 | Composition for formation of upper layer film, and method for formation of photoresist pattern | Yukio Nishimura, Hiromitsu Nakashima, Norihiro Natsume, Daita Kouno | 2014-11-25 |
| 8697344 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | Daita Kouno, Gouji Wakamatsu, Norihiro Natsume, Yukio Nishimura, Makoto Sugiura | 2014-04-15 |
| 8501389 | Upper layer-forming composition and resist patterning method | Kazunori Kusabiraki, Takahiro Hayama, Motoyuki Shima, Kiyoshi Tanaka | 2013-08-06 |
| 8497062 | Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method | Norihiro Natsume, Junichi Takahashi | 2013-07-30 |
| 8431332 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | Daita Kouno, Gouji Wakamatsu, Norihiro Natsume, Yukio Nishimura, Makoto Sugiura | 2013-04-30 |