| 8148702 |
Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns |
Hans-Joachim Doering, Thomas Elster, Joachim Heinitz |
2012-04-03 |
| 7349106 |
Apparatus and method for thin-layer metrology |
— |
2008-03-25 |
| 7277190 |
Measurement system with an optical measurement arrangement |
Detlef Wolter |
2007-10-02 |
| 6775583 |
Method and apparatus for user guidance in optical inspection and measurement of thin films and substrates, and software therefore |
Karl-Heinz Irmer |
2004-08-10 |
| 6618154 |
Optical measurement arrangement, in particular for layer thickness measurement |
Horst Engel, Hakon Mikkelsen, Lambert Danner, Kuno Backhaus, Joachim Wienecke |
2003-09-09 |
| 6456373 |
Method and apparatus for monitoring the light emitted from an illumination apparatus for an optical measuring instrument |
Joachim Wienecke, Kuno Backhaus, Detlef Wolter, Horst-Dieter Jaritz |
2002-09-24 |