Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10634990 | Photomask and methods for manufacturing and correcting photomask | Takaharu Nagai, Hiroshi Mohri, Yasutaka Morikawa | 2020-04-28 |
| 10394118 | Photomask and methods for manufacturing and correcting photomask | Takaharu Nagai, Hiroshi Mohri, Yasutaka Morikawa | 2019-08-27 |
| 10048580 | Photomask and methods for manufacturing and correcting photomask | Takaharu Nagai, Hiroshi Mohri, Yasutaka Morikawa | 2018-08-14 |
| 9971238 | Mask blank, phase shift mask, and production method thereof | Hiroshi Watanabe, Hideyoshi Takamizawa, Youhei Ohkawa, Takashi Adachi, Ayako Tani +1 more | 2018-05-15 |
| 9874808 | Mask blank, mask blank with negative resist film, phase shift mask, and method for producing pattern formed body using same | Takashi Adachi, Youichi Miura, Hideyoshi Takamizawa, Youhei Ohkawa, Hiroshi Watanabe +1 more | 2018-01-23 |
| 9519211 | Photomask and methods for manufacturing and correcting photomask | Takaharu Nagai, Hiroshi Mohri, Yasutaka Morikawa | 2016-12-13 |
| 8974987 | Photomask and methods for manufacturing and correcting photomask | Takaharu Nagai, Hideyoshi Takamizawa, Hiroshi Mohri, Yasutaka Morikawa | 2015-03-10 |
| 7736985 | Method for manufacturing semiconductor device using overlapping exposure and semiconductor device thereof | Hiroyuki Enomoto, Shuntaro Machida | 2010-06-15 |
| 7387867 | Manufacturing method of semiconductor integrated circuit device | Norio Hasegawa, Shoji Hotta | 2008-06-17 |
| 7252910 | Fabrication method of semiconductor integrated circuit device and mask fabrication method | Norio Hasegawa, Shinji Kubo, Yasuhiro Koizumi, Yasushi Kawai | 2007-08-07 |
| 7172853 | Method of manufacturing semiconductor integrated circuit devices | Norio Hasegawa, Akira Imai | 2007-02-06 |
| 7115344 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 2006-10-03 |
| 7001712 | Manufacturing method of semiconductor integrated circuit device | Akira Imai, Norio Hasegawa | 2006-02-21 |
| 6841399 | Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device | Norio Hasegawa, Shinji Kubo, Yasuhiro Koizumi, Hironobu Takaya, Morihisa Hoga | 2005-01-11 |
| 6824958 | Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device | Norio Hasegawa | 2004-11-30 |
| 6750496 | Manufacturing method of semiconductor integrated circuit device, and semiconductor integrated circuit device | Akira Imai, Norio Hasegawa | 2004-06-15 |
| 6733953 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 2004-05-11 |
| 6713231 | Method of manufacturing semiconductor integrated circuit devices | Norio Hasegawa, Akira Imai | 2004-03-30 |
| 6706452 | Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device | Norio Hasegawa | 2004-03-16 |
| 6632744 | Manufacturing method of semiconductor integrated circuit device | Akira Imai, Norio Hasegawa | 2003-10-14 |
| 6548312 | Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methods | Norio Hasegawa, Akira Imai, Naoko Asai, Eiji Tsujimoto, Takahiro Watanabe | 2003-04-15 |
| 6403413 | Manufacturing method of semiconductor integrated circuit device having a capacitor | Akira Imai, Norio Hasegawa | 2002-06-11 |
| 6383718 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 2002-05-07 |
| 6329112 | Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens | Hiroshi Fukuda, Seiichiro Shirai, Tsuneo Terasawa, Norio Hasegawa | 2001-12-11 |
| 6258513 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 2001-07-10 |