Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE40963 | Method for plasma processing by shaping an induced electric field | Nobuo Ishii | 2009-11-10 |
| RE39020 | Plasma process apparatus | Kiichi Hama, Toshiaki Hongoh | 2006-03-21 |
| 6350347 | Plasma processing apparatus | Nobuo Ishii | 2002-02-26 |
| 6265031 | Method for plasma processing by shaping an induced electric field | Nobuo Ishii | 2001-07-24 |
| 6136139 | Plasma processing apparatus | Nobuo Ishii | 2000-10-24 |
| 6136140 | Plasma processing apparatus | Nobuo Ishii | 2000-10-24 |
| RE36371 | Method of forming polycrystalline silicon film in process of manufacturing LCD | Issei Imahashi, Kiichi Hama | 1999-11-02 |
| 5938883 | Plasma processing apparatus | Nobuo Ishii | 1999-08-17 |
| 5795429 | Plasma processing apparatus | Nobuo Ishii | 1998-08-18 |
| 5792261 | Plasma process apparatus | Kiichi Hama, Toshiaki Hongoh | 1998-08-11 |
| 5571366 | Plasma processing apparatus | Nobuo Ishii, Chishio Koshimizu, Yoshifumi Tahara, Hiroshi Nishikawa, Isei Imahashi | 1996-11-05 |
| 5531834 | Plasma film forming method and apparatus and plasma processing apparatus | Shuichi Ishizuka, Kohei Kawamura, Akira Suzuki | 1996-07-02 |
| 5529630 | Apparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystals | Issei Imahashi, Kiichi Hama | 1996-06-25 |
| 5525159 | Plasma process apparatus | Kiichi Hama, Toshiaki Hongoh | 1996-06-11 |
| 5522934 | Plasma processing apparatus using vertical gas inlets one on top of another | Akira Suzuki, Shuichi Ishizuka, Kohei Kawamura | 1996-06-04 |
| 5476182 | Etching apparatus and method therefor | Shuichi Ishizuka, Kohei Kawamura | 1995-12-19 |
| 5413958 | Method for manufacturing a liquid crystal display substrate | Issei Imahashi, Kiichi Hama | 1995-05-09 |
| 5372836 | Method of forming polycrystalling silicon film in process of manufacturing LCD | Issei Imahashi, Kiichi Hama | 1994-12-13 |