Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6431114 | Method and apparatus for plasma processing | Nobuo Ishii, Satoru Kawakami, Yoshinobu Kawai, Yoko Ueda | 2002-08-13 |
| 6284668 | Plasma polishing method | — | 2001-09-04 |
| RE36371 | Method of forming polycrystalline silicon film in process of manufacturing LCD | Kiichi Hama, Jiro Hata | 1999-11-02 |
| 5695564 | Semiconductor processing system | — | 1997-12-09 |
| 5554223 | Plasma processing apparatus with a rotating electromagnetic field | — | 1996-09-10 |
| 5537004 | Low frequency electron cyclotron resonance plasma processor | Takayuki Fukasawa | 1996-07-16 |
| 5529630 | Apparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystals | Kiichi Hama, Jiro Hata | 1996-06-25 |
| 5413958 | Method for manufacturing a liquid crystal display substrate | Kiichi Hama, Jiro Hata | 1995-05-09 |
| 5414244 | Semiconductor wafer heat treatment apparatus | — | 1995-05-09 |
| 5374327 | Plasma processing method | Nobuo Ishii, Chishio Koshimizu | 1994-12-20 |
| 5372836 | Method of forming polycrystalling silicon film in process of manufacturing LCD | Kiichi Hama, Jiro Hata | 1994-12-13 |
| 5342472 | Plasma processing apparatus | Nobuo Ishii | 1994-08-30 |
| 5338362 | Apparatus for processing semiconductor wafer comprising continuously rotating wafer table and plural chamber compartments | — | 1994-08-16 |
| 5198755 | Probe apparatus | Towl Ikeda, Teruo Iwata | 1993-03-30 |
| 5173641 | Plasma generating apparatus | Nobuo Ishii | 1992-12-22 |
| 5004924 | Wafer transport apparatus for ion implantation apparatus | — | 1991-04-02 |
| 4873447 | Wafer transport apparatus for ion implantation apparatus | — | 1989-10-10 |
| 4525659 | Positioning stage having a vibration suppressor | Teruo Asakawa | 1985-06-25 |
| 4441250 | Apparatus for registering a mask pattern in a photo-etching apparatus for semiconductor devices | — | 1984-04-10 |
| 4397078 | Method and apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits | — | 1983-08-09 |
| 4390827 | Linear motor | — | 1983-06-28 |
| 4377028 | Method for registering a mask pattern in a photo-etching apparatus for semiconductor devices | — | 1983-03-22 |
| 4347452 | Micro-displacement device | — | 1982-08-31 |