Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8058161 | Recessed STI for wide transistors | Andrew Marshall, Brian K. Kirkpatrick | 2011-11-15 |
| 7939398 | Method to manufacture silicon quantum islands and single-electron devices | Christoph Wasshuber, Olivier Faynot | 2011-05-10 |
| 7642144 | Transistors with recessed active trenches for increased effective gate width | Andrew Marshall | 2010-01-05 |
| 7344957 | SOI wafer with cooling channels and a method of manufacture thereof | — | 2008-03-18 |
| 7198993 | Method of fabricating a combined fully-depleted silicon-on-insulator (FD-SOI) and partially-depleted silicon-on-insulator (PD-SOI) devices | Howard L. Tigelaar, Olivier Faynot | 2007-04-03 |
| 7122413 | Method to manufacture silicon quantum islands and single-electron devices | Christoph Wasshuber, Olivier Faynot | 2006-10-17 |
| 6875656 | Method for improving silicon-on-insulator (SOI) film uniformity on a semiconductor wafer | — | 2005-04-05 |
| 6438439 | Equipment evaluation and design | Joseph C. Davis, Purnendu K. Mozumder, Richard G. Burch | 2002-08-20 |
| 6104487 | Plasma etching with fast endpoint detector | David W. Buck | 2000-08-15 |
| 5864773 | Virtual sensor based monitoring and fault detection/classification system and method for semiconductor processing equipment | Stephanie W. Butler, Donald A. Sofge, David Anthony White | 1999-01-26 |
| 5512130 | Method and apparatus of etching a clean trench in a semiconductor material | James G. Frank, Richard P. VanMeurs, Duane E. Carter | 1996-04-30 |
| 5326975 | Measurement of gas leaks into gas lines of a plasma reactor | — | 1994-07-05 |
| 5254216 | Oxygen scavenging in a plasma reactor | James G. Frank | 1993-10-19 |
| 4859277 | Method for measuring plasma properties in semiconductor processing | Demetre J. Economou | 1989-08-22 |
| 4847792 | Process and apparatus for detecting aberrations in production process operations | Charles R. Ratliff | 1989-07-11 |