Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7052820 | Silicon-containing resist for photolithography | Jörg Rottstegge, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle, Michael Sebald | 2006-05-30 |
| 7018784 | Process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarity | Jörg Rottstegge, Waltraud Herbst, Gertrud Falk | 2006-03-28 |
| 6946236 | Negative resist process with simultaneous development and aromatization of resist structures | Jörg Rottstegge, Christian Eschbaumer, Gertrud Falk, Michael Sebald | 2005-09-20 |
| 6893972 | Process for sidewall amplification of resist structures and for the production of structures having reduced structure size | Jörg Rottstegge, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle, Gertrud Falk +1 more | 2005-05-17 |
| 6770423 | Negative resist process with simultaneous development and silylation | Jörg Rottstegge, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle, Gertrud Falk +1 more | 2004-08-03 |
| 5733706 | Dry-developable positive resist | Recai Sezi, Rainer Leuschner, Horst Borndorfer, Eva Rissel, Michael Sebald +2 more | 1998-03-31 |
| 5486447 | Negative resists with high thermal stability comprising end capped polybenzoxazole and bisazide | Albert Hammerschmidt, Erwin Schmidt | 1996-01-23 |
| 5281335 | Process, installation and reactor for biological treatment of waste water | — | 1994-01-25 |
| 4654415 | Method for the preparation of polyimide and polyisoindoloquinazoline dione precursors | Hellmut Ahne | 1987-03-31 |
| 4398009 | Polyoxazole precursor and the preparation thereof | Hellmut Ahne, Roland Rubner | 1983-08-09 |
| 4397999 | Polyimidazole and polyimidazopyrrolone precursor stages and the preparation thereof | Hellmut Ahne, Roland Rubner | 1983-08-09 |
| 4395482 | Method for the preparation of heat-resistant relief structures using positive resists | Hellmut Ahne, Roland Rubner | 1983-07-26 |
| 4385165 | Polyimide, polyisoindoloquinazoline dione, polyoxazine dione and polyquinazoline dione precursor stages and the manufacture | Hellmut Ahne, Roland Rubner | 1983-05-24 |
| 4371685 | Radiation-reactive precursor stages of highly heat-resistant polymers | Hellmut Ahne, Roland Rubner | 1983-02-01 |
| 4366230 | Method for the preparation of highly heat-resistant relief structures and the use thereof | Hellmut Ahne, Roland Rubner | 1982-12-28 |
| 4339521 | Heat resistant positive resists containing polyoxazoles | Hellmut Ahne, Roland Rubner | 1982-07-13 |
| 4332883 | Method for the manufacture of highly heat-resistant relief structures | Hellmut Ahne, Roland Rubner, Erwin Schmidt | 1982-06-01 |
| 4332882 | Method for the preparation of highly heat-resistant relief | Hellmut Ahne, Roland Rubner | 1982-06-01 |
| 4329556 | N-Azidosulfonylaryl-maleinimides | Roland Rubner, Hellmut Ahne | 1982-05-11 |
| 4311785 | Method for the preparation of highly heat-resistant relief structures and the use thereof | Hellmut Ahne, Roland Rubner, Erwin Schmidt | 1982-01-19 |
| 4292398 | Method for the preparation of relief structures by phototechniques | Roland Rubner, Hellmut Ahne | 1981-09-29 |
| 4287294 | Method for the preparation of relief structures by phototechniques | Roland Rubner, Hellmut Ahne | 1981-09-01 |
| RE30186 | Method for the preparation of relief structures | Roland Rubner, Wolfgang Kleeberg | 1980-01-08 |