Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8575588 | Phase change memory cell with heater and method therefor | Leo Mathew, Tushar P. Merchant, Ramachandran Muralidhar | 2013-11-05 |
| 8247850 | Dual interlayer dielectric stressor integration with a sacrificial underlayer film stack | Ross E. Noble, David C. Wang | 2012-08-21 |
| 8076215 | Method of forming an electronic device using a separation technique | Leo Mathew | 2011-12-13 |
| 8043888 | Phase change memory cell with heater and method therefor | Leo Mathew, Tushar P. Merchant, Ramachandran Muralidhar | 2011-10-25 |
| 7998822 | Semiconductor fabrication process including silicide stringer removal processing | John R. Alvis, Michael G. Harrison, Leo Mathew, John E. Moore, Rode R. Mora | 2011-08-16 |
| 7927934 | SOI semiconductor device with body contact and method thereof | Byoung W. Min | 2011-04-19 |
| 7749884 | Method of forming an electronic device using a separation-enhancing species | Leo Mathew | 2010-07-06 |
| 7713801 | Method of making a semiconductor structure utilizing spacer removal and semiconductor structure | Vishal P. Trivedi, Michael D. Turner | 2010-05-11 |
| 7622339 | EPI T-gate structure for CoSi2 extendibility | Mark D. Hall, Mehul D. Shroff, Edward O. Travis | 2009-11-24 |
| 7544575 | Dual metal silicide scheme using a dual spacer process | Olubunmi O. Adetutu, Randy W. Cotton | 2009-06-09 |
| 7544576 | Diffusion barrier for nickel silicides in a semiconductor fabrication process | Chun-Li Liu, Marius Orlowski | 2009-06-09 |
| 7521314 | Method for selective removal of a layer | Konstantin V. Loiko, Andrew G. Nagy | 2009-04-21 |
| 7510922 | Spacer T-gate structure for CoSi2 extendibility | Mark D. Hall, Mehul D. Shroff, Edward O. Travis | 2009-03-31 |
| 7446006 | Semiconductor fabrication process including silicide stringer removal processing | John R. Alvis, Michael G. Harrison, Leo Mathew, John E. Moore, Rode R. Mora | 2008-11-04 |
| 7262105 | Semiconductor device with silicided source/drains | Nigel G. Cave, Michael Rendon | 2007-08-28 |
| 7235471 | Method for forming a semiconductor device having a silicide layer | Tab A. Stephens | 2007-06-26 |
| 7235473 | Dual silicide semiconductor fabrication process | Chong-Cheng Fu, Mark D. Hall | 2007-06-26 |
| 7105429 | Method of inhibiting metal silicide encroachment in a transistor | — | 2006-09-12 |