Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10923329 | Substrate processing apparatus and substrate processing method | Eiichi Nishimura, Akitaka Shimizu, Fumiko Yamashita | 2021-02-16 |
| 10825688 | Method for etching copper layer | Shigeru Tahara, Kenji Matsumoto, Hidenori Miyoshi | 2020-11-03 |
| 9660182 | Plasma processing method and plasma processing apparatus | Takashi Sone, Masato Kushibiki, Nao Koizumi, Wataru Kume, Eiichi Nishimura +1 more | 2017-05-23 |