| 7239443 |
Condenser optic with sacrificial reflective surface |
Glenn D. Kubiak, Sung-Hun Lee |
2007-07-03 |
| 7081992 |
Condenser optic with sacrificial reflective surface |
Glenn D. Kubiak, Sang Hun Lee |
2006-07-25 |
| 6815129 |
Compensation of flare-induced CD changes EUVL |
John E. Bjorkholm, Daniel G. Stearns, Eric M. Gullikson, Scott D. Hector |
2004-11-09 |
| 6642995 |
Mask-to-wafer alignment system |
William C. Sweatt, Steven J. Haney |
2003-11-04 |
| 6469827 |
Diffraction spectral filter for use in extreme-UV lithography condenser |
William C. Sweatt, Luis J. Bernardez |
2002-10-22 |
| 6229871 |
Projection lithography with distortion compensation using reticle chuck contouring |
— |
2001-05-08 |
| 6031598 |
Extreme ultraviolet lithography machine |
Glenn D. Kubiak, Steven J. Haney, Donald W. Sweeney |
2000-02-29 |
| 4441816 |
Optical double-slit particle measuring system |
Kenneth R. Hencken, James Wang |
1984-04-10 |