Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7049033 | EUV lithography reticles fabricated without the use of a patterned absorber | Daniel G. Stearns, Paul B. Mirkarimi | 2006-05-23 |
| 7022435 | Method for the manufacture of phase shifting masks for EUV lithography | Daniel G. Stearns, Paul B. Mirkarimi, Anton Barty | 2006-04-04 |
| 6967168 | Method to repair localized amplitude defects in a EUV lithography mask blank | Daniel G. Stearns, Paul B. Mirkarimi, Henry N. Chapman | 2005-11-22 |
| 6821682 | Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography | Daniel G. Stearns, Paul B. Mirkarimi | 2004-11-23 |
| 6635391 | Method for fabricating reticles for EUV lithography without the use of a patterned absorber | Daniel G. Stearns, Paul B. Mirkarimi | 2003-10-21 |
| 6235434 | Method for mask repair using defect compensation | Avijit K. Ray-Chaudhuri | 2001-05-22 |
| 6210865 | Extreme-UV lithography condenser | William C. Sweatt, David Shafer, James P. McGuire | 2001-04-03 |
| 6031598 | Extreme ultraviolet lithography machine | Daniel A. Tichenor, Glenn D. Kubiak, Steven J. Haney | 2000-02-29 |
| 5986795 | Deformable mirror for short wavelength applications | Henry N. Chapman | 1999-11-16 |
| 5973826 | Reflective optical imaging system with balanced distortion | Henry N. Chapman, Russell Hudyma, David Shafer | 1999-10-26 |
| 4949389 | Optical ranked-order filtering using threshold decomposition | Jan P. Allebach, Ellen Ochoa | 1990-08-14 |
| 4838644 | Position, rotation, and intensity invariant recognizing method | Ellen Ochoa, George F. Schils | 1989-06-13 |
| 4516743 | Scanning beam beamrider missile guidance system | Neal C. Gallagher, Charles R. Christensen | 1985-05-14 |