Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10901121 | Planarization of optical substrates | Christopher J. Stolz, James A. Folta, Regina Soufli, Christopher C. Walton, Justin Wolfe +2 more | 2021-01-26 |
| 10175391 | Planarization of optical substrates | Christopher J. Stolz, Jim Folta, Regina Soufli, Christopher C. Walton, Justin Wolfe +2 more | 2019-01-08 |
| 7049033 | EUV lithography reticles fabricated without the use of a patterned absorber | Daniel G. Stearns, Donald W. Sweeney | 2006-05-23 |
| 7022435 | Method for the manufacture of phase shifting masks for EUV lithography | Daniel G. Stearns, Donald W. Sweeney, Anton Barty | 2006-04-04 |
| 6967168 | Method to repair localized amplitude defects in a EUV lithography mask blank | Daniel G. Stearns, Donald W. Sweeney, Henry N. Chapman | 2005-11-22 |
| 6821682 | Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography | Daniel G. Stearns, Donald W. Sweeney | 2004-11-23 |
| 6635391 | Method for fabricating reticles for EUV lithography without the use of a patterned absorber | Daniel G. Stearns, Donald W. Sweeney | 2003-10-21 |
| 6319635 | Mitigation of substrate defects in reticles using multilayer buffer layers | Sasa Bajt, Daniel G. Stearns | 2001-11-20 |
| 6309705 | Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings | Claude Montcalm | 2001-10-30 |
| 6134049 | Method to adjust multilayer film stress induced deformation of optics | Eberhard A. Spiller, Claude Montcalm, Sasa Bajt, James A. Folta | 2000-10-17 |
| 6110607 | High reflectance-low stress Mo-Si multilayer reflective coatings | Claude Montcalm | 2000-08-29 |
| 6011646 | Method to adjust multilayer film stress induced deformation of optics | Claude Montcalm | 2000-01-04 |