DC

Daniel C. Cole

IBM: 14 patents #8,004 of 70,183Top 15%
CO Coldquanta: 1 patents #21 of 50Top 45%
Overall (All Time): #311,541 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11928554 Comparing Rabi oscillation stimulations Woo Chang Chung 2024-03-12
6704695 Interactive optical proximity correction design method Orest Bula, Edward W. Conrad, William C. Leipold 2004-03-09
6667136 Method to control nested to isolated line printing Orest Bula, Edward W. Conrad, William C. Leipold 2003-12-23
6458493 Method to control nested to isolated line printing Orest Bula, Edward W. Conrad, William C. Leipold 2002-10-01
6429469 Optical Proximity Correction Structures Having Decoupling Capacitors Archibald J. Allen, Orest Bula, John M. Cohn, Edward W. Conrad, William C. Leipold 2002-08-06
6430733 Contextual based groundrule compensation method of mask data set generation John M. Cohn 2002-08-06
6425112 Auto correction of error checked simulated printed images Orest Bula, Edward W. Conrad, William C. Leipold 2002-07-23
6387596 Method of forming resist images by periodic pattern removal Edward W. Conrad, David V. Horak, Randy W. Mann, Paul W. Pastel, Jed H. Rankin +1 more 2002-05-14
6383719 Process for enhanced lithographic imaging Orest Bula, Edward W. Conrad, Stephen E. Knight, Robert K. Leidy 2002-05-07
6373975 Error checking of simulated printed images with process window effects included Orest Bula, Edward W. Conrad, William C. Leipold 2002-04-16
6268908 Micro adjustable illumination aperture Orest Bula, Edward W. Conrad, David V. Horak, Jed H. Rankin 2001-07-31
6261724 Method of modifying a microchip layout data set to generate a predicted mask printed data set Orest Bula, Edward W. Conrad, William C. Leipold, Donald J. Samuels 2001-07-17
6258490 Transmission control mask utilized to reduce foreshortening effects Orest Bula, Edward W. Conrad, William C. Leipold 2001-07-10
6238850 Method of forming sharp corners in a photoresist layer Orest Bula, Edward W. Conrad, William C. Leipold 2001-05-29
6214494 Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability Orest Bula, Edward W. Conrad, Ning Lu 2001-04-10