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Alternating phase shift mask inspection using biased inspection data |
Karen D. Badger, Michael S. Hibbs |
2010-06-22 |
| 7619730 |
Mask inspection DNIR replacement based on location of tri-tone level database images—2P shapes |
Karen D. Badger, David L. Katcoff, Jeffrey P. Lissor |
2009-11-17 |
| 7494748 |
Method for correction of defects in lithography masks |
James W. Adkisson, Eric M. Coker, Jed H. Rankin, Anthony K. Stamper |
2009-02-24 |
| 7443497 |
Mask inspection DNIR placement based on location of tri-tone level database images (2P shapes) |
Karen D. Badger, David L. Katcoff, Jeffrey P. Lissor |
2008-10-28 |
| 7168224 |
Method of making a packaged radiation sensitive resist film-coated workpiece |
Marie Angelopoulos, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros, Wayne M. Moreau +2 more |
2007-01-30 |
| 6989219 |
Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks |
— |
2006-01-24 |
| 6811959 |
Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks |
— |
2004-11-02 |
| 6543617 |
Packaged radiation sensitive coated workpiece process for making and method of storing same |
Marie Angelopoulos, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros, Wayne M. Moreau +2 more |
2003-04-08 |