Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10861674 | Compensated location specific processing apparatus and method | Matthew C. Gwinn, Martin D. Tabat, Kenneth Regan, Michael Graf | 2020-12-08 |
| 10497540 | Compensated location specific processing apparatus and method | Matthew C. Gwinn, Martin D. Tabat, Kenneth Regan, Michael Graf | 2019-12-03 |
| 10256095 | Method for high throughput using beam scan size and beam position in gas cluster ion beam processing system | Soo Doo Chae, Noel Russell, Joshua LaRose, Nicholas Joy, Luis Fernandez +3 more | 2019-04-09 |
| 9735019 | Process gas enhancement for beam treatment of a substrate | Michael Graf, Noel Russell, Matthew C. Gwinn | 2017-08-15 |
| 8263474 | Reduced defect silicon or silicon germanium deposition in micro-features | Anthony Dip, John Gumpher, Seungho Oh | 2012-09-11 |
| 7737051 | Silicon germanium surface layer for high-k dielectric integration | Anthony Dip, Pradip K. Roy, Sanjeev Kaushal, Seungho Oh, Raymond Joe | 2010-06-15 |
| 7524769 | Method and system for removing an oxide from a substrate | Anthony Dip, Seungho Oh | 2009-04-28 |
| 7501349 | Sequential oxide removal using fluorine and hydrogen | Anthony Dip, Seungho Oh | 2009-03-10 |
| 7468311 | Deposition of silicon-containing films from hexachlorodisilane | Anthony Dip, Seungho Oh | 2008-12-23 |
| 7405140 | Low temperature formation of patterned epitaxial Si containing films | Anthony Dip, Seungho Oh | 2008-07-29 |
| 7358194 | Sequential deposition process for forming Si-containing films | Anthony Dip, Seungho Oh | 2008-04-15 |
| 7205187 | Micro-feature fill process and apparatus using hexachlorodisilane or other chlorine-containing silicon precursor | Anthony Dip, Seungho Oh | 2007-04-17 |