Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7156933 | Configuration and method for mounting a backing film to a polish head | Katrin Ebner, David P. Erdmann, Lutz Teichgräber | 2007-01-02 |
| 7097535 | Method and configuration for conditioning a polishing pad surface | Benno Utess, Andreas Purath | 2006-08-29 |
| 7070479 | Arrangement and method for conditioning a polishing pad | Peter Faustmann, Andreas Purath, Benno Utess | 2006-07-04 |
| 6974770 | Self-aligned mask to reduce cell layout area | Gregory Costrini, Kia-Seng Low, David L. Rath, Michael C. Gaidis | 2005-12-13 |
| 6824456 | Configuration for polishing disk-shaped objects | Katrin Ebner | 2004-11-30 |
| 6812141 | Recessed metal lines for protective enclosure in integrated circuits | Michael C. Gaidis, Joachim Nuetzel, Eugene J. O'Sullivan, Gregory Costrini, Stephen L. Brown +2 more | 2004-11-02 |
| 6739013 | Wafer cleaning apparatus | Lutz Teichgräber | 2004-05-25 |
| 6593238 | Method for determining an endpoint and semiconductor wafer | David Weston Haggart, Jr. | 2003-07-15 |
| 6419567 | Retaining ring for chemical-mechanical polishing (CMP) head, polishing apparatus, slurry cycle system, and method | — | 2002-07-16 |
| 6375549 | Polishing head for wafer, and method for polishing | Lutz Teichgräber, David Weston Haggart, Jr., Katrin Ebner | 2002-04-23 |
| 6103592 | Manufacturing self-aligned polysilicon fet devices isolated with maskless shallow trench isolation and gate conductor fill technology with active devices and dummy doped regions formed in mesas | Max G. Levy, Bernhard Fiegl, Frank Prein | 2000-08-15 |
| 5804490 | Method of filling shallow trenches | Bernhard Fiegl, Max G. Levy, Victor R. Nastasi | 1998-09-08 |
| 4528071 | Process for the production of masks having a metal carrier foil | — | 1985-07-09 |
| 4393129 | Method of stress-free development of irradiated polymethylmetacrylate | Grigore-Vlad Ghica | 1983-07-12 |