Issued Patents All Time
Showing 1,126–1,139 of 1,139 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8735272 | Integrated circuit having a replacement gate structure and method for fabricating the same | Xiuyu Cai, Kangguo Cheng, Ali Khakifirooz | 2014-05-27 |
| 8728908 | Methods of forming a dielectric cap layer on a metal gate structure | Chang Seo Park, William James Taylor, III, John A. Iacoponi | 2014-05-20 |
| 8703557 | Methods of removing dummy fin structures when forming finFET devices | Xiuyu Cai, Kangguo Cheng, Ali Khakifirooz | 2014-04-22 |
| 8691696 | Methods for forming an integrated circuit with straightened recess profile | Xiuyu Cai, Xunyuan Zhang, Errol Todd Ryan, John A. Iacoponi | 2014-04-08 |
| 8692316 | Isolation structures for FinFET semiconductor devices | — | 2014-04-08 |
| 8679968 | Method for forming a self-aligned contact opening by a lateral etch | Su Chen Fan, Pranatharthiharan Haran Balasubramanian, David V. Horak, Ponoth Shom | 2014-03-25 |
| 8679909 | Recessing and capping of gate structures with varying metal compositions | David V. Horak, Su Chen Fan, Pranatharthiharan Haran Balasubramanian | 2014-03-25 |
| 8617973 | Semiconductor device fabrication methods with enhanced control in recessing processes | Robert J. Miller | 2013-12-31 |
| 8609480 | Methods of forming isolation structures on FinFET semiconductor devices | — | 2013-12-17 |
| 8580634 | Methods of forming 3-D semiconductor devices with a nanowire gate structure wherein the nanowire gate structure is formed prior to source/drain formation | Xiuyu Cai, Kangguo Cheng, Ali Khakifirooz | 2013-11-12 |
| 8551843 | Methods of forming CMOS semiconductor devices | Xiuyu Cai | 2013-10-08 |
| 8541274 | Methods of forming 3-D semiconductor devices with a nanowire gate structure wherein the nanowire gate structure is formed after source/drain formation | Xiuyu Cai, Kangguo Cheng, Ali Khakifirooz | 2013-09-24 |
| 8524592 | Methods of forming semiconductor devices with self-aligned contacts and low-k spacers and the resulting devices | Xiuyu Cai, Kangguo Cheng, Ali Khakifirooz | 2013-09-03 |
| 8354320 | Methods of controlling fin height of FinFET devices by performing a directional deposition process | Robert J. Miller | 2013-01-15 |