JS

John P. Simons

IBM: 39 patents #2,420 of 70,183Top 4%
📍 Cold Spring, NY: #4 of 66 inventorsTop 7%
🗺 New York: #2,725 of 115,490 inventorsTop 3%
Overall (All Time): #83,337 of 4,157,543Top 3%
39
Patents All Time

Issued Patents All Time

Showing 26–39 of 39 patents

Patent #TitleCo-InventorsDate
6622507 Electromechanical device and a process of preparing same John M. Cotte, Kenneth McCullough, Wayne M. Moreau, Charles J. Taft, Richard P. Volant 2003-09-23
6579464 Fixtures for processing a workpiece in a supercritical fluid John M. Cotte, Matteo Flotta, Kenneth McCullough, Wayne M. Moreau, Charles J. Taft 2003-06-17
6561220 Apparatus and method for increasing throughput in fluid processing Kenneth McCullough, Wayne M. Moreau, Charles J. Taft, John M. Cotte 2003-05-13
6558475 Process for cleaning a workpiece using supercritical carbon dioxide Jesse Jur, Kenneth McCullough, Wayne M. Moreau, Charles J. Taft 2003-05-06
6509136 Process of drying a cast polymeric film disposed on a workpiece Dario L. Goldfarb, Kenneth McCullough, David R. Medeiros, Wayne M. Moreau, Charles J. Taft 2003-01-21
6457480 Process and apparatus for cleaning filters John M. Cotte, Kenneth McCullough, Wayne M. Moreau, Keith R. Pope, Charles J. Taft 2002-10-01
6454869 Process of cleaning semiconductor processing, handling and manufacturing equipment John M. Cotte, Dario L. Goldfarb, Kenneth McCullough, Wayne M. Moreau, Keith R. Pope +1 more 2002-09-24
6451375 Process for depositing a film on a nanometer structure John M. Cotte, Kenneth McCullough, Wayne M. Moreau, Charles J. Taft 2002-09-17
6425956 Process for removing chemical mechanical polishing residual slurry John M. Cotte, Donald J. Delehanty, Kenneth McCullough, Wayne M. Moreau, Charles J. Taft +1 more 2002-07-30
6398875 Process of drying semiconductor wafers using liquid or supercritical carbon dioxide John M. Cotte, Dario L. Goldfarb, Kenneth McCullough, Wayne M. Moreau, Keith R. Pope +1 more 2002-06-04
6346484 Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structures John M. Cotte, Christopher V. Jahnes, Kenneth McCullough, Wayne M. Moreau, Satyanarayana V. Nitta +1 more 2002-02-12
5770345 Photoresist having increased sensitivity and use thereof Edward D. Babich, Karen E. Petrillo, David E. Seeger 1998-06-23
5753412 Photoresist having increased sensitivity and use thereof Edward D. Babich, Karen E. Petrillo, David E. Seeger 1998-05-19
5593812 Photoresist having increased sensitivity and use thereof Edward D. Babich, Karen E. Petrillo, David E. Seeger 1997-01-14