EL

Effendi Leobandung

IBM: 476 patents #23 of 70,183Top 1%
Globalfoundries: 13 patents #279 of 4,424Top 7%
ET Elpis Technologies: 3 patents #8 of 121Top 7%
TE Tessera: 2 patents #162 of 271Top 60%
UM University of Minnesota: 1 patents #1,216 of 2,951Top 45%
📍 Stormville, NY: #1 of 88 inventorsTop 2%
🗺 New York: #24 of 115,490 inventorsTop 1%
Overall (All Time): #396 of 4,157,543Top 1%
496
Patents All Time

Issued Patents All Time

Showing 301–325 of 496 patents

Patent #TitleCo-InventorsDate
9685410 Semiconductor device security 2017-06-20
9679775 Selective dopant junction for a group III-V semiconductor device Kevin K. Chan, Marinus Hopstaken, Young-Hee Kim, Masaharu Kobayashi, Deborah A. Neumayer +3 more 2017-06-13
9673056 Method to improve finFET cut overlay Tenko Yamashita 2017-06-06
9666748 Integrated on chip detector and zero waveguide module structure for use in DNA sequencing 2017-05-30
9660069 Group III nitride integration with CMOS technology Can Bayram, Christopher P. D'Emic, William J. Gallagher, Devendra K. Sadana 2017-05-23
9653464 Asymmetric band gap junctions in narrow band gap MOSFET 2017-05-16
9653347 Vertical air gap subtractive etch back end metal 2017-05-16
9647091 Annealed metal source drain overlapping the gate 2017-05-09
9640442 CMOS fin integration on SOI substrate Tenko Yamashita 2017-05-02
9640536 Method to make dual material finFET on same substrate 2017-05-02
9627266 Dual-semiconductor complementary metal-oxide-semiconductor device Sanghoon Lee, Renee T. Mo, Yanning Sun 2017-04-18
9627478 Integrated vertical nanowire memory 2017-04-18
9627276 Self-aligned low defect segmented III-V finFET 2017-04-18
9627271 III-V compound semiconductor channel material formation on mandrel after middle-of-the-line dielectric formation Renee T. Mo 2017-04-18
9627482 Reduced current leakage semiconductor device Cheng-Wei Cheng, Pranita Kerber, Young-Hee Kim, Yanning Sun 2017-04-18
9620643 Reducing parasitic capacitance and resistance in finFET 2017-04-11
9614042 Heterojunction tunnel field effect transistor fabrication using limited lithography steps 2017-04-04
9613963 Dual material finFET on single substrate 2017-04-04
9608099 Nanowire semiconductor device Wilfried Haensch, Tenko Yamashita 2017-03-28
9601599 Aspect ratio for semiconductor on insulator 2017-03-21
9601476 Optoelectronics and CMOS integration on GOI substrate Ning Li, Devendra K. Sadana 2017-03-21
9601385 Method of making a dual strained channel semiconductor device 2017-03-21
9595445 Floating body storage device employing a charge storage trench 2017-03-14
9590057 Reduced parasitic capacitance with slotted contact 2017-03-07
9590085 Method and structure for III-V FinFET 2017-03-07