AG

Alfred Grill

IBM: 190 patents #180 of 70,183Top 1%
Globalfoundries: 9 patents #393 of 4,424Top 9%
Applied Materials: 4 patents #2,506 of 7,310Top 35%
AM AMD: 3 patents #3,141 of 9,279Top 35%
Samsung: 2 patents #37,631 of 75,807Top 50%
📍 Yorktown Heights, NY: #6 of 858 inventorsTop 1%
🗺 New York: #150 of 115,490 inventorsTop 1%
Overall (All Time): #3,446 of 4,157,543Top 1%
198
Patents All Time

Issued Patents All Time

Showing 151–175 of 198 patents

Patent #TitleCo-InventorsDate
6391773 Method and materials for through-mask electroplating and selective base removal Panayotis Andricacos, Cyril Cabral, Jr., Roy A. Carruthers, Katherine L. Saenger 2002-05-21
6388285 Feram cell with internal oxygen source and method of oxygen release Charles T. Black, Cyril Cabral, Jr., Deborah A. Neumayer, Wilbur D. Pricer, Katherine L. Saenger +1 more 2002-05-14
6346747 Method for fabricating a thermally stable diamond-like carbon film as an intralevel or interlevel dielectric in a semiconductor device and device made Christopher V. Jahnes, Vishnubhai V. Patel 2002-02-12
6337518 Low dielectric constant amorphous fluorinated carbon and method of preparation Vishnubhai V. Patel 2002-01-08
6333202 Flip FERAM cell and method to form same James W. Adkisson, Charles T. Black, Randy W. Mann, Deborah A. Neumayer, Wilbur D. Pricer +2 more 2001-12-25
6316167 Tunabale vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and application thereof Marie Angelopoulos, Katherina Babich, Scott D. Halle, Arpan Mahorowala, Vishnubhai V. Patel 2001-11-13
6312793 Multiphase low dielectric constant material Vishnubhai V. Patel, Stephen M. Gates 2001-11-06
6265779 Method and material for integration of fuorine-containing low-k dielectrics Christopher V. Jahnes, Vishnubhai V. Patel, Katherine L. Saenger 2001-07-24
6242321 Structure and fabrication method for non-planar memory elements Raul E. Acosta, James H. Comfort, David E. Kotecki, Katherine L. Saenger 2001-06-05
6188120 Method and materials for through-mask electroplating and selective base removal Panayotis Andricacos, Cyril Cabral, Jr., Roy A. Carruthers, Katherine L. Saenger 2001-02-13
6147009 Hydrogenated oxidized silicon carbon material Christopher V. Jahnes, Vishnubhai V. Patel, Laurent Perraud 2000-11-14
6140226 Dual damascene processing for semiconductor chip interconnects John P. Hummel, Christopher V. Jahnes, Vishnubhai V. Patel, Katherine L. Saenger 2000-10-31
6131258 Sidewall capacitor with L-shaped dielectric Katherine L. Saenger, James H. Comfort, David E. Kotecki 2000-10-17
6049443 Suspension bent by stressed patch Michael Moser, Vishnubhai V. Patel, Clinton David Snyder, Celia E. Yeack-Scranton 2000-04-11
6030904 Stabilization of low-k carbon-based dielectrics Christopher V. Jahnes, Vishnubhai V. Patel, Katherine L. Saenger 2000-02-29
6027966 Isolated sidewall capacitor Katherine L. Saenger, James H. Comfort, David E. Kotecki 2000-02-22
6017814 Structure and fabrication method for stackable, air-gap-containing low epsilon dielectric layers Katherine L. Saenger 2000-01-25
5981000 Method for fabricating a thermally stable diamond-like carbon film Christopher V. Jahnes, Vishnubhai V. Patel 1999-11-09
5963397 Ceramic suspension bent by stressed patch Michael Moser, Vishnubhai V. Patel, Clinton David Snyder, Celia E. Yeack-Scranton 1999-10-05
5945155 Low dielectric constant amorphous fluorinated carbon and method of preparation Vishnubhai V. Patel 1999-08-31
5942328 Low dielectric constant amorphous fluorinated carbon and method of preparation Vishnubhai V. Patel 1999-08-24
5942769 Low dielectric constant amorphous fluorinated carbon and method of preparation Vishnubhai V. Patel 1999-08-24
5932907 Method, materials, and structures for noble metal electrode contacts to silicon David E. Kotecki, Katherine L. Saenger 1999-08-03
5914851 Isolated sidewall capacitor Katherine L. Saenger, James H. Comfort, David E. Kotecki 1999-06-22
5869880 Structure and fabrication method for stackable, air-gap-containing low epsilon dielectric layers Katherine L. Saenger 1999-02-09