Issued Patents All Time
Showing 26–37 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6348741 | Semiconductor apparatus and a manufacturing method thereof | Masahiko Ogino, Takao Miwa, Toshiya Satoh, Akira Nagai, Tadanori Segawa +3 more | 2002-02-19 |
| 6291619 | Photosensitive resin composition, method for forming pattern therefrom, electronic devices produced by using the same, and method for production thereof | Yasunari Maekawa, Takao Miwa, Yoshiaki Okabe | 2001-09-18 |
| 6097100 | Resin sealed semiconductor devices and a process for manufacturing the same | Shuji Eguchi, Yasuhide Sugawara, Toshiaki Ishii, Hiroyoshi Kokaku, Akira Nagai +7 more | 2000-08-01 |
| 5858584 | Positive photosensitive resin composition and electronic apparatus using the same | Yoshiaki Okabe, Takao Miwa, Yasunari Maekawa, Geraldine Rames-Langlade, Mina Ishida | 1999-01-12 |
| 5470996 | Pattern forming material and process for forming pattern using the same | Hiroshi Shiraishi, Nobuaki Hayashi, Emiko Fukuma, Keiko Tadano | 1995-11-28 |
| 5441849 | Method of forming pattern and making semiconductor device using radiation-induced conductive resin bottom resist layer | Hiroshi Shiraishi, Fumio Murai, Hajime Hayakawa, Asao Isobe | 1995-08-15 |
| 5328807 | Method of forming a pattern | Toshihiko Tanaka, Norio Hasegawa, Toshiaki Yamanaka, Akira Imai, Hiroshi Shiraishi +1 more | 1994-07-12 |
| 5118582 | Pattern forming material and process for forming pattern using the same | Hiroshi Shiraishi, Nobuaki Hayashi, Emiko Fukuma, Keiko Tadano | 1992-06-02 |
| 4985344 | Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer | Shoichi Uchino, Takao Iwayanagi, Saburo Nonogaki, Michiaki Hashimoto | 1991-01-15 |
| 4835089 | Resist pattern forming process with dry etching | Takao Iwayanagi, Norio Hasegawa, Toshihiko Tanaka, Hiroshi Shiraishi, Michiaki Hashimoto +2 more | 1989-05-30 |
| 4722881 | Radiation-sensitive resist composition with an admixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane | Hiroshi Shiraishi, Takashi Nishida, Nobuaki Hayashi | 1988-02-02 |
| 4465768 | Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate | Hiroshi Shiraishi, Takao Iwayanagi, Takahiro Kohashi, Saburo Nonogaki | 1984-08-14 |