| 6894334 |
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
2005-05-17 |
$82,000 |
| 6548847 |
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING A FIRST WIRING STRIP EXPOSED THROUGH A CONNECTING HOLE, A TRANSITION-METAL FILM IN THE CONNECTING HOLE AND AN ALUMINUM WIRING STRIP THEREOVER, AND A TRANSITION-METAL NITRIDE FILM BETWEEN THE ALUMINUM WIRING STRIP AND THE TRANSITION-METAL FILM |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
2003-04-15 |
$98,000 |
| 6342412 |
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
2002-01-29 |
$286,000 |
| 6169324 |
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
2001-01-02 |
$569,000 |
| 6127255 |
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
2000-10-03 |
$928,000 |
| 6040110 |
Process and apparatus for the removal of resist |
Toshihiko Onozuka, Takayuki Noishiki, Satoshi Sakai, Katsuhiro Sasajima, Eiji Toyoda +1 more |
2000-03-21 |
|
| 5811316 |
Method of forming teos oxide and silicon nitride passivation layer on aluminum wiring |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
1998-09-22 |
$131,000 |
| 5780882 |
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
1998-07-14 |
$166,000 |
| 5739589 |
Semiconductor integrated circuit device process for fabricating the same and apparatus for fabricating the same |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
1998-04-14 |
$140,000 |
| 5725971 |
Method of manufacturing phase shift masks and a method of manufacturing semiconductor integrated circuit devices |
Noboru Moriuchi, Toshihiko Onozuka |
1998-03-10 |
$155,000 |
| 5557147 |
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
1996-09-17 |
$76,000 |
| 5331191 |
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
1994-07-19 |
$89,000 |
| 5202275 |
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more |
1993-04-13 |
$55,000 |
