MT

Masatoshi Tsuneoka

HI Hitachi: 14 patents #2,889 of 28,497Top 15%
HE Hitachi Vlsi Engineering: 11 patents #38 of 666Top 6%
EB Ebara: 1 patents #1,014 of 1,611Top 65%
NG Ngr: 1 patents #6 of 23Top 30%
📍 Wenatchee, WA: #22 of 245 inventorsTop 9%
🗺 Washington: #6,154 of 76,902 inventorsTop 9%
Overall (All Time): #300,701 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
8013315 Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same Kenji Watanabe, Takeshi Murakami, Ryo Tajima, Masahiro Hatakeyama, Nobuharu Noji 2011-09-06
7983471 Pattern inspection apparatus and method Tadashi Kitamura, Toshiaki Hasebe 2011-07-19
6894334 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 2005-05-17
6548847 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING A FIRST WIRING STRIP EXPOSED THROUGH A CONNECTING HOLE, A TRANSITION-METAL FILM IN THE CONNECTING HOLE AND AN ALUMINUM WIRING STRIP THEREOVER, AND A TRANSITION-METAL NITRIDE FILM BETWEEN THE ALUMINUM WIRING STRIP AND THE TRANSITION-METAL FILM Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 2003-04-15
6342412 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 2002-01-29
6169324 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 2001-01-02
6127255 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 2000-10-03
5811316 Method of forming teos oxide and silicon nitride passivation layer on aluminum wiring Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1998-09-22
5780882 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1998-07-14
5739589 Semiconductor integrated circuit device process for fabricating the same and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1998-04-14
5557147 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1996-09-17
5331191 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1994-07-19
5202275 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1993-04-13
5068710 Semiconductor device with multilayer base contact Nobuo Owada, Mitsuaki Horiuchi, Tadayuki Taneoka 1991-11-26
5060050 Semiconductor integrated circuit device Mitsuaki Horiuchi 1991-10-22
4931410 Process for producing semiconductor integrated circuit device having copper interconnections and/or wirings, and device produced Takafumi Tokunaga, Koichiro Mizukami 1990-06-05