MI

Masaru Izawa

HH Hitachi High-Technologies: 48 patents #37 of 1,917Top 2%
HI Hitachi: 20 patents #1,757 of 28,497Top 7%
SI Sumitomo Metal Industries: 5 patents #111 of 1,462Top 8%
RT Renesas Technology: 2 patents #1,374 of 3,337Top 45%
NE Nec: 1 patents #7,889 of 14,502Top 55%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
TC Tanaka Seimitsu Kogyo Co.: 1 patents #7 of 34Top 25%
Honda Motor Co.: 1 patents #12,035 of 21,052Top 60%
Overall (All Time): #25,592 of 4,157,543Top 1%
75
Patents All Time

Issued Patents All Time

Showing 26–50 of 75 patents

Patent #TitleCo-InventorsDate
9490104 Heat treatment apparatus Ken'etsu Yokogawa, Masatoshi Miyake, Takashi Uemura, Satoshi Sakai 2016-11-08
9368377 Plasma processing apparatus Takumi Tandou, Kenetsu Yokogawa 2016-06-14
9150964 Vacuum processing apparatus Hiroyuki Kobayashi, Kenetsu Yokogawa, Kenji Maeda 2015-10-06
9070724 Vacuum processing apparatus and plasma processing apparatus with temperature control function for wafer stage Takumi Tandou 2015-06-30
9038567 Plasma processing apparatus Hiroyuki Kobayashi, Kenji Maeda, Kenetsu Yokogawa, Tadamitsu Kanekiyo 2015-05-26
8955579 Plasma processing apparatus and plasma processing method Takumi Tandou, Kenetsu Yokogawa 2015-02-17
8833089 Plasma processing apparatus and maintenance method therefor Takumi Tandou 2014-09-16
8733282 Plasma processing apparatus Hiroyuki Kobayashi, Kenji Maeda, Kenetsu Yokogawa, Tadamitsu Kanekiyo 2014-05-27
8632688 Plasma processing apparatus and plasma processing method Kouichi Yamamoto, Kenji Nakata, Atsushi Itou 2014-01-21
8496781 Plasma processing apparatus Kenetsu Yokogawa, Kenji Maeda 2013-07-30
8491751 Plasma processing apparatus Hiroyuki Kobayashi 2013-07-23
8426764 Plasma processing apparatus and plasma processing method Takumi Tandou, Kenetsu Yokogawa 2013-04-23
8397668 Plasma processing apparatus Hiroyuki Kobayashi, Kenji Maeda, Kenetsu Yokogawa, Tadamitsu Kanekiyo 2013-03-19
8349127 Vacuum processing apparatus and plasma processing apparatus with temperature control function for wafer stage Takumi Tandou 2013-01-08
8333847 Chemical conversion treatment liquid Kunio Goto 2012-12-18
8197635 Plasma processing apparatus including etching processing apparatus and ashing processing apparatus and plasma processing method using plasma processing apparatus Hiroyuki Kobayashi 2012-06-12
8187485 Plasma processing apparatus including etching processing apparatus and ashing processing apparatus and plasma processing method using plasma processing apparatus Hiroyuki Kobayashi 2012-05-29
8142567 Vacuum processing apparatus Hiroyuki Kobayashi, Kenji Maeda, Makoto Nawata 2012-03-27
8034181 Plasma processing apparatus Takumi Tandou, Ken'etsu Yokogawa 2011-10-11
8029874 Plasma processing apparatus and method for venting the same to atmosphere Hiroyuki Kobayashi, Kenji Maeda, Kenetsu Yokogawa 2011-10-04
7918945 Method for manufacturing surface treated steel material using a chemical conversion treatment liquid Kunio Goto 2011-04-05
7915055 Manufacturing method of semiconductor device Masaru Kurihara, Junichi Tanaka 2011-03-29
7842619 Plasma processing method Masatoshi Miyake, Kenji Maeda, Kenetsu Yokogawa 2010-11-30
7838792 Plasma processing apparatus capable of adjusting temperature of sample stand Takumi Tandou, Ken'etsu Yokogawa, Seiichiro Kanno 2010-11-23
7767054 Plasma processing apparatus Hiroyuki Kobayashi, Kenetsu Yokogawa, Tomoyuki Tamura, Kenji Maeda 2010-08-03