MC

Min-hwa Chi

Globalfoundries: 120 patents #10 of 4,424Top 1%
TSMC: 56 patents #575 of 12,232Top 5%
NS National Semiconductor: 27 patents #38 of 2,238Top 2%
VS Vanguard International Semiconductor: 19 patents #24 of 585Top 5%
SC Sien (Qingdao) Integrated Circuits Co.: 17 patents #1 of 20Top 5%
WM Worldwide Semiconductor Manufacturing: 10 patents #4 of 58Top 7%
S( Semiconductor Manufacturing International (Shanghai): 9 patents #50 of 1,122Top 5%
FO Foveonics: 6 patents #2 of 7Top 30%
FO Foveon: 3 patents #12 of 65Top 20%
GU Globalfoundries U.S.: 1 patents #344 of 665Top 55%
📍 Qingdao, NY: #1 of 10 inventorsTop 10%
Overall (All Time): #1,618 of 4,157,543Top 1%
273
Patents All Time

Issued Patents All Time

Showing 201–225 of 273 patents

Patent #TitleCo-InventorsDate
6271084 Method of fabricating a metal-insulator-metal (MIM), capacitor structure using a damascene process Yeur-Luen Tu, Chia-Shiung Tsai 2001-08-07
6262447 Single polysilicon DRAM cell and array with current gain 2001-07-17
6255713 Current source using merged vertical bipolar transistor based on gate induced gate leakage current 2001-07-03
6240015 Method for reading 2-bit ETOX cells using gate induced drain leakage current Dahcheng Lin 2001-05-29
6200852 Method to fabricate DRAM capacitor Chine-Gie Lou 2001-03-13
6184548 DRAM cell and array to store two-bit data having merged stack capacitor and trench capacitor George Meng-Jaw Cherng 2001-02-06
6181601 Flash memory cell using p+/N-well diode with double poly floating gate 2001-01-30
6174770 Method for forming a crown capacitor having HSG for DRAM memory 2001-01-16
6174767 Method of fabrication of capacitor and bit-line at same level for 8F2 DRAM cell with minimum bit-line coupling noise 2001-01-16
6175605 Edge triggered delay line, a multiple adjustable delay line circuit, and an application of same 2001-01-16
6171923 Method for fabricating a DRAM cell structure on an SOI wafer incorporating a two dimensional trench capacitor Chih-Yuan Lu 2001-01-09
6163482 One transistor EEPROM cell using ferro-electric spacer 2000-12-19
6160286 Method for operation of a flash memory using n+/p-well diode 2000-12-12
6144075 CMOS inverter using gate induced drain leakage current 2000-11-07
6143607 Method for forming flash memory of ETOX-cell programmed by band-to-band tunneling induced substrate hot electron and read by gate induced drain leakage current 2000-11-07
6136635 Method for forming a bipolar-based active pixel sensor cell with poly contact and increased capacitive coupling to the base region Albert Bergemont 2000-10-24
6133780 Digitally tunable voltage reference using a neuron MOSFET 2000-10-17
6133604 NOR array architecture and operation methods for ETOX cells capable of full EEPROM functions 2000-10-17
6111788 Method for programming and erasing a triple-poly split-gate flash Chih-Ming Chen 2000-08-29
6111286 Low voltage low power n-channel flash memory cell using gate induced drain leakage current Chih-Ming Chen 2000-08-29
6111925 Clock synchronized delay scheme using edge-triggered delay lines and latches with one clock lock time 2000-08-29
6091635 Electron injection method for substrate-hot-electron program and erase V.sub.T tightening for ETOX cell Chih-Ming Chen 2000-07-18
6088058 Capacitive coupled bipolar active pixel imager having overflow protection and electronic shutter Carver A. Mead, Tobi Delbruck 2000-07-11
6087690 Single polysilicon DRAM cell with current gain 2000-07-11
6088259 SRAM cell using two single transistor inverters 2000-07-11