Issued Patents All Time
Showing 76–100 of 107 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6490509 | Car controlling unit using a multitasking system | Masaaki Takahashi, Hiroshi Ito | 2002-12-03 |
| 6479209 | Positive photosensitive composition | Toshiaki Aoai, Morio Yagihara | 2002-11-12 |
| 6479211 | Positive photoresist composition for far ultraviolet exposure | Kunihiko Kodama, Toshiaki Aoai, Hajime Nakao | 2002-11-12 |
| 6420082 | Positive resist fluid and positive resist composition | Kunihiko Kodama, Toshiaki Aoai | 2002-07-16 |
| 6416925 | Positive working photosensitive composition | Toshiaki Aoai, Shiro Tan | 2002-07-09 |
| 6410204 | Positive photoresist composition | Kunihiko Kodama, Toshiaki Aoai | 2002-06-25 |
| 6303265 | Positive photoresist composition for exposure to far ultraviolet light | — | 2001-10-16 |
| 6291130 | Positive photosensitive composition | Kunihiko Kodama, Toshiaki Aoai | 2001-09-18 |
| 6245485 | Positive resist composition | Toshiaki Aoai, Shunichi Kondo, Tsuguo Yamaoka | 2001-06-12 |
| 6242153 | Positive photoresist composition for far ultraviolet ray exposure | Toshiaki Aoai | 2001-06-05 |
| 6238842 | Positive photosensitive composition | Toshiaki Aoai | 2001-05-29 |
| 6214517 | Positive photoresist composition | Toshiaki Aoai | 2001-04-10 |
| 6159655 | Positive photoresist composition for exposure to far ultraviolet light | — | 2000-12-12 |
| 6159656 | Positive photosensitive resin | Yasumasa Kawabe, Toshiaki Aoai | 2000-12-12 |
| 6150068 | Photosensitive resin composition for far-ultraviolet exposure | Kunihiko Kodama, Kazuya Uenishi, Toshiaki Aoai | 2000-11-21 |
| 6103449 | Negative working photoresist composition | — | 2000-08-15 |
| 6042991 | Positive working photosensitive composition | Toshiaki Aoai, Shiro Tan | 2000-03-28 |
| 5981140 | Positive photosensitive composition | Kunihiko Kodama, Kazuya Uenishi, Toshiaki Aoai | 1999-11-09 |
| 5945250 | Positive photosensitive composition | Toshiaki Aoai, Kunihiko Kodama | 1999-08-31 |
| 5750310 | Positive photoresist composition | Shinji Sakaguchi, Makoto Momota | 1998-05-12 |
| 5747218 | Positive photoresist composition | Makoto Momota, Shinji Sakaguchi | 1998-05-05 |
| 5700620 | Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound | Shinji Sakaguchi, Toshiaki Aoai | 1997-12-23 |
| 5667932 | Positive photoresist composition | Kunihiko Kodama, Makoto Momota | 1997-09-16 |
| 5639587 | Positive photoresist composition containing alkali soluble resins and quinonediazide ester mixture | Koji Shirakawa, Shinji Sakaguchi | 1997-06-17 |
| 5629128 | Positive photoresist composition | Koji Shirakawa, Kunihiko Kodama, Yasumasa Kawabe, Shinji Sakaguchi | 1997-05-13 |