Issued Patents All Time
Showing 51–75 of 107 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6846610 | Positive photosensitive resin composition | Yasumasa Kawabe, Toshiaki Aoai | 2005-01-25 |
| 6824956 | Positive resist composition | — | 2004-11-30 |
| 6818377 | Positive photosensitive composition | Kunihiko Kodama, Toshiaki Aoai | 2004-11-16 |
| 6808860 | Positive photoresist composition | Toshiaki Aoai | 2004-10-26 |
| 6806022 | Positive photosensitive resin composition | Yasumasa Kawabe, Toshiaki Aoai | 2004-10-19 |
| 6794108 | Positive photoresist composition for far ultraviolet exposure | Yutaka Adegawa, Toshiaki Aoai, Kunihiko Kodama | 2004-09-21 |
| 6790970 | (Meth) acrylic acid ester compound | Toshiaki Aoai | 2004-09-14 |
| 6787282 | Positive resist composition | — | 2004-09-07 |
| 6787283 | Positive photoresist composition for far ultraviolet exposure | Toshiaki Aoai, Kunihiko Kodama | 2004-09-07 |
| 6777160 | Positive-working resist composition | Kunihiko Kodama | 2004-08-17 |
| 6727039 | Positive photoresist composition | — | 2004-04-27 |
| 6716565 | Positive image-forming material | Kazuto Kunita | 2004-04-06 |
| 6699635 | Positive photosensitive composition | Kunihiko Kodama, Toshiaki Aoai, Yasumasa Kawabe | 2004-03-02 |
| 6696219 | Positive resist laminate | Shoichiro Yasunami | 2004-02-24 |
| 6692884 | Positive photoresist composition | Toru Fujimori, Kunihiko Kodama, Toshiaki Aoai | 2004-02-17 |
| 6670095 | Positive-working resist composition | Kunihiko Kodama, Toshiaki Aoai | 2003-12-30 |
| 6632586 | Positive resist composition | Toshiaki Aoai | 2003-10-14 |
| 6602646 | Positive-working resist composition | Kunihiko Kodama, Toshiaki Aoai | 2003-08-05 |
| 6596458 | Positive-working photoresist composition | Kunihiko Kodama, Toshiaki Aoai, Yasumasa Kawabe | 2003-07-22 |
| 6589705 | Positive-working photoresist composition | Kazuyoshi Mizutani, Shoichiro Yasunami | 2003-07-08 |
| 6576392 | Positive photoresist composition | Kunihiko Kodama, Toshiaki Aoai, Hidekazu Ohashi | 2003-06-10 |
| 6544715 | Positive photoresist composition for far ultraviolet ray exposure | Kunihiko Kodama, Toshiaki Aoai | 2003-04-08 |
| 6528229 | Positive photoresist composition | — | 2003-03-04 |
| 6517991 | Positive photosensitive composition | Kunihiko Kodama, Toshiaki Aoai | 2003-02-11 |
| 6506535 | Positive working photoresist composition | Kazuyoshi Mizutani, Kunihiko Kodama | 2003-01-14 |