Issued Patents All Time
Showing 26–50 of 107 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8460850 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same | Akinori Shibuya, Shuhei Yamaguchi, Hiroshi Inada | 2013-06-11 |
| 8299055 | 8-substituted isoquinoline derivative and the use thereof | Shunsuke Kaneko, Daisuke Shikanai, Rintaro Yamada, Katsuhiko Sakurada | 2012-10-30 |
| 8241830 | Positive resist composition and a pattern forming method using the same | — | 2012-08-14 |
| 8173349 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | Masanori Hikita, Yasufumi Ooishi | 2012-05-08 |
| 8133550 | Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device | Tsukasa Yamanaka | 2012-03-13 |
| 7712450 | Ignition timing control apparatus and ignition timing control method for internal combustion engine | Tomohiro Fujita, Akito Onishi, Mitsuhiro Nada | 2010-05-11 |
| 7615324 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | Naoya Sugimoto | 2009-11-10 |
| 7615331 | Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device | Tsukasa Yamanaka | 2009-11-10 |
| 7598009 | Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device | Naoya Sugimoto | 2009-10-06 |
| 7371501 | Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same | Tsukasa Yamanaka | 2008-05-13 |
| 7368216 | Photosensitive resin composition and manufacturing method of semiconductor device using the same | Tsukasa Yamanaka | 2008-05-06 |
| 7351515 | Positive resist composition and pattern-forming method using the same | Shoichiro Yasunami, Kenji Wada, Kunihiko Kodama | 2008-04-01 |
| 7348122 | Photosensitive resin composition and method for manufacturing semiconductor device using the same | Tsukasa Yamanaka | 2008-03-25 |
| 7291441 | Positive resist composition and pattern forming method utilizing the same | — | 2007-11-06 |
| 7252924 | Positive resist composition and method of pattern formation using the same | Tsukasa Yamanaka | 2007-08-07 |
| 7223516 | Positive type photoresist composition | Toshiaki Aoai | 2007-05-29 |
| 7179578 | Positive resist composition | Kazuya Uenishi | 2007-02-20 |
| 7122589 | Positive resist composition and pattern formation method using the same | Fumiyuki Nishiyama, Kunihiko Kodama | 2006-10-17 |
| 7105275 | Positive resist composition and method of forming pattern using the same | — | 2006-09-12 |
| 7052434 | Throttle opening degree control apparatus for internal combustion engine | Hironobu Makino, Koji Wada | 2006-05-30 |
| 6962766 | Positive photoresist composition | Kazuya Uenishi, Toshiaki Aoai | 2005-11-08 |
| 6927009 | Positive photosensitive composition | Kunihiko Kodama, Toru Fujimori | 2005-08-09 |
| 6897004 | Intermediate layer material composition for multilayer resist process and pattern formation process using the same | Kazuya Uenishi | 2005-05-24 |
| 6858370 | Positive photosensitive composition | Kunihiko Kodama | 2005-02-22 |
| 6852468 | Positive resist composition | — | 2005-02-08 |