Issued Patents All Time
Showing 76–100 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5657415 | Apparatus for reproducing moving pictures from motion parameters and moving picture coding and decoding system | — | 1997-08-12 |
| 5631113 | Electron-beam exposure system for reduced distortion of electron beam spot | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Keiji Yamada +1 more | 1997-05-20 |
| 5608226 | Electron-beam exposure method and system | Hiroshi Yasuda | 1997-03-04 |
| 5546319 | Method of and system for charged particle beam exposure | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Hisayasu Nishino +8 more | 1996-08-13 |
| 5466549 | Method of detecting and adjusting exposure conditions of charged particle exposure system | — | 1995-11-14 |
| 5449915 | Electron beam exposure system capable of detecting failure of exposure | Yoshihisa Oae | 1995-09-12 |
| 5444257 | Electron-beam exposure system for reduced distortion of electron beam spot | Takamasa Satoh, Hiroshi Yasuda, Junichi Kai, Yoshihisa Oae, Keiji Yamada +1 more | 1995-08-22 |
| 5432314 | Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate | Satoru Yamazaki, Yoshihisa Oae, Kiichi Sakamoto | 1995-07-11 |
| 5404019 | Charged particle exposure system having a capability of checking the shape of a charged particle beam used for exposure | Manabu Ohno | 1995-04-04 |
| 5404018 | Method of and an apparatus for charged particle beam exposure | Hiroshi Yasuda, Yoshihisa Oae, Nobuyuki Yasutake, Hisayasu Nishino | 1995-04-04 |
| 5391886 | Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system | Yoshihisa Oae, Satoru Yamazaki, Tomohiko Abe, Katsuhiko Kobayashi, Kiichi Sakamoto +1 more | 1995-02-21 |
| 5382800 | Charged particle beam exposure method and apparatus | Hisayasu Nishino, Yoshihisa Oae, Hiroshi Yasuda | 1995-01-17 |
| 5372524 | Rectangular multiple connector | — | 1994-12-13 |
| 5368613 | Electron beam exposure apparatus | Nobuyuki Yasutake | 1994-11-29 |
| 5338939 | Charged particle beam exposure including a heat blocking partition positioned near deflecting coils | Hisayasu Nishino, Yoshihisa Oae, Hiroshi Yasuda | 1994-08-16 |
| 5326282 | Miniature multiple electrical connector | Yoshiaki Igarashi, Yukio Saitoh, Fumio Furuya | 1994-07-05 |
| 5304811 | Lithography system using charged-particle beam and method of using the same | Yoshihisa Oae, Satoru Yamazaki, Tomohiko Abe | 1994-04-19 |
| 5301197 | Bit error ratio detector | Katsuhiro Sasaki | 1994-04-05 |
| 5276334 | Charged particle beam exposure method and apparatus | Kiichi Sakamoto, Kenichi Kawashima | 1994-01-04 |
| 5272347 | Apparatus for adjusting a focal position of an electron beam and electron beam projection apparatus including the same | Yoshihisa Oae, Hiroshi Yasuda | 1993-12-21 |
| 5264706 | Electron beam exposure system having an electromagnetic deflector configured for efficient cooling | Yoshihisa Oae, Hiroshi Yasuda | 1993-11-23 |
| 5260579 | Charged particle beam exposure system and charged particle beam exposure method | Hiroshi Yasuda, Yasushi Takahashi, Kiichi Sakamoto, Yoshihisa Oae, Junichi Kai +2 more | 1993-11-09 |
| 5201675 | Miniature multiple electrical connector | Yoshiaki Igarashi, Yukio Saitoh, Fumio Furuya | 1993-04-13 |
| 5177365 | Charged particle beam exposure device for improving the heating state of block mask | — | 1993-01-05 |
| 5173582 | Charged particle beam lithography system and method | Kiichi Sakamoto, Hiroshi Yasuda | 1992-12-22 |