Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7474386 | Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method | Tadahito Fujisawa, Soichi Inoue, Makoto Kobayashi, Masashi Ichikawa, Tsuneyuki Hagiwara | 2009-01-06 |
| 7372449 | Display device, image display device and display method | Seiichi Inoue, Ryoichi Yamamoto, Kazuo Sanada, Koichi Kimura, Tsutomu Yokouchi | 2008-05-13 |
| 7365830 | Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method | Tadahito Fujisawa, Soichi Inoue, Makoto Kobayashi, Masashi Ichikawa, Tsuneyuki Hagiwara | 2008-04-29 |
| 7325894 | Liquid droplet discharge head, liquid droplet discharge device, and image forming apparatus | — | 2008-02-05 |
| 7316465 | Liquid discharge apparatus and inkjet recording apparatus | — | 2008-01-08 |
| 7304620 | Image display apparatus and image display method | Ryoichi Yamamoto, Seiichi Inoue, Tsutomu Yokouchi, Kazuo Sanada, Koichi Kimura | 2007-12-04 |
| 7230680 | Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method | Tadahito Fujisawa, Soichi Inoue, Makoto Kobayashi, Masashi Ichikawa, Tsuneyuki Hagiwara | 2007-06-12 |
| 7207648 | Inkjet head and method of cleaning inkjet head | Toshiya Kojima | 2007-04-24 |
| 7204579 | Droplet discharging head and inkjet recording apparatus | — | 2007-04-17 |
| 7128404 | Droplet discharge head and inkjet recording apparatus | — | 2006-10-31 |
| 7070262 | Droplet ejecting head | Ryoichi Yamamoto, Kazuo Sanada | 2006-07-04 |
| 6696681 | F-&thgr; lens, beam scanning device, and imaging apparatus | — | 2004-02-24 |
| 6590598 | Image forming apparatus | — | 2003-07-08 |
| 6480219 | Exposure head | Atsushi Uejima, Hisamitsu Hori | 2002-11-12 |
| 6433809 | Method of controlling light intensity in image exposure apparatus | — | 2002-08-13 |
| 6324005 | Focusing optical system | — | 2001-11-27 |
| 6061371 | System for monitoring amount of light emitted from surface emitting laser | Atsushi Uejima, Yoshiharu Okino, Yoshinori Morimoto, Toshiyuki Inoue | 2000-05-09 |
| 5995195 | Method and apparatus for exposing photosensitive materials | Kensuke Goda | 1999-11-30 |
| 5905851 | Light beam scanning recording device | Yoshinori Morimoto, Yoshiharu Okino, Atsushi Uejima, Toshiyuki Inoue | 1999-05-18 |
| 5822105 | Scanner | Misako Kurihara | 1998-10-13 |
| 5751748 | System for monitoring amount of light emitted from surface emitting laser | Atsushi Uejima, Yoshiharu Okino, Yoshinori Morimoto, Toshiyuki Inoue | 1998-05-12 |
| 5646673 | Exposure device | — | 1997-07-08 |
| 5573894 | Method and apparatus for exposing photosensitive materials | Kensuke Goda | 1996-11-12 |
| 4685805 | Small gap measuring apparatus | Akikazu Tanimoto, Hisao Izawa, Yoichi Hamashima, Junji Hazama | 1987-08-11 |