TS

Takamasa Sakai

DC Dainippon Screen Mfg. Co.: 14 patents #24 of 977Top 3%
CC Clarion Co.: 10 patents #52 of 721Top 8%
TT The University Of Tokyo: 2 patents #500 of 2,633Top 20%
Sumitomo Electric Industries: 1 patents #13,249 of 21,551Top 65%
PA Panasonic: 1 patents #13,264 of 21,108Top 65%
Overall (All Time): #127,169 of 4,157,543Top 4%
29
Patents All Time

Issued Patents All Time

Showing 1–25 of 29 patents

Patent #TitleCo-InventorsDate
12227642 Polymer gel having sponge-like porous structure Yuichi Tei 2025-02-18
10550225 Process for producing low-concentration gel using gel-precursor clusters, and gel obtained by said production process Yuichi Tei 2020-02-04
7869062 Apparatus for supporting substrate, apparatus for measuring surface potential, apparatus for measuring film thickness, and apparatus for inspecting substrate Yoshiyuki Nakazawa 2011-01-11
7539097 Optical disk device Youichi Ogura, Toshihiko Takahashi, Teruhiko Izumi, Shinichi Konishi, Hironori Deguchi 2009-05-26
7190643 Land pre-pit address demodulating device Akihiro Shibata, Dai Ichiryu 2007-03-13
7073521 Substrate processing apparatus comprising ring-shaped motor 2006-07-11
6598805 Substrate cleaning apparatus Sadao Hirae 2003-07-29
5857474 Method of and apparatus for washing a substrate Sadao Hirae, Minobu Matsunaga 1999-01-12
5554939 Non-destructive measuring sensor for semiconductor wafer and method of manufacturing the same Sadao Hirae, Hideaki Matsubara, Motohiro Kouno 1996-09-10
5444389 Method and apparatus for measuring lifetime of minority carriers in semiconductor Sadao Hirae, Motohiro Kouno 1995-08-22
5239183 Optical gap measuring device using frustrated internal reflection Motohiro Kouno, Ikuyoshi Nakatani, Sadao Hirae 1993-08-24
5233291 Method of and apparatus for measuring electric characteristics of semiconductor wafer Motohiro Kouno, Ikuyoshi Nakatani 1993-08-03
5225690 Gap measuring device and method using frustrated internal reflection Motohiro Kouno, Sadao Hirae, Ikuyoshi Nakatani 1993-07-06
4883424 Apparatus for heat treating substrates Yuusuke Muraoka 1989-11-28
4849608 Apparatus for heat-treating wafers Yusuke Muraoka, Atsushi Tamada, Hitoshi Haibara, Keiji Nakagawa 1989-07-18
4803948 Heat processing apparatus for semiconductor manufacturing Keiji Nakagawa, Ikuyoshi Nakatani, Yusuke Muraoka 1989-02-14
4798926 Method of heating semiconductor and susceptor used therefor 1989-01-17
4746857 Probing apparatus for measuring electrical characteristics of semiconductor device formed on wafer Motohiro Kono, Takayuki Umaba, Yoshiyuki Nakagawa, Yoshihiro Koyama 1988-05-24
4693208 Feeder of oxygen gas containing steam 1987-09-15
4630082 Semiconductor device with multi-electrode construction equivalent to variable capacitance diode 1986-12-16
4529995 Variable capacitance device Shoichi Minagawa 1985-07-16
4529994 Variable capacitor with single depletion layer 1985-07-16
4473767 Surface acoustic wave convolver with depletion layer control Shoichi Minagawa, Takeshi Okamoto 1984-09-25
4466876 Thin layer depositing apparatus Yasuhiko Sato 1984-08-21
4456917 Variable capacitor Yasuo Sato 1984-06-26