Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12139642 | CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same | Eui Rang LEE, Yoon Young KOO, Won Jung Kim, Hyeong Mook KIM, Tae Won Park +1 more | 2024-11-12 |
| 11608471 | Composition for etching silicon nitride film and etching method using same | Ki Wook Hwang, Sang-Ran Koh, Jung Min Choi, Kwen-Woo Han, Jun-Young Jang +1 more | 2023-03-21 |
| 11560495 | CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same | Won Jung Kim, Yoon Young KOO, Tae Won Park, Eui Rang LEE, Jong Won Lee | 2023-01-24 |
| 10093830 | Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer | Wan-Hee Lim, Taek-Soo Kwak, Han-Song Lee, Eun Su Park, Sun-Hae Kang +8 more | 2018-10-09 |
| 9902873 | Composition for forming silica based layer, and method for manufacturing silica based layer | Jin-Hee Bae, Taek-Soo Kwak, Han-Song Lee, Byeong-Gyu Hwang, Bo-Sun Kim +6 more | 2018-02-27 |
| 9823566 | Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition | Yong-Woon Yoon, Sung Jae Lee, Joon-Young Moon, You-Jung Park, Chul-Ho Lee | 2017-11-21 |
| 9725389 | Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition | Yun-Jun Kim, Hwan-Sung Cheon, Yong-Woon Yoon, Chung-Heon Lee, Hyo-Young Kwon +1 more | 2017-08-08 |
| 9671688 | Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition | Seung-Wook SHIN, Yun-Jun Kim, Hea-Jung Kim, Yoo-Jeong Choi | 2017-06-06 |
| 9556094 | Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition | Yun-Jun Kim, Hyo-Young Kwon, Hea-Jung Kim, Chung-Heon Lee, Yoo-Jeong Choi | 2017-01-31 |
| 9529257 | Hard mask composition and method for forming pattern using same | Chul-Ho Lee, You-Jung Park, Yong-Woon Yoon, Sung Jae Lee, Young Min Kim +1 more | 2016-12-27 |
| 9513546 | Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition | You-Jung Park, Hea-Jung Kim, Yo-Choul PARK, Yong-Woon Yoon, Sung Jae Lee +1 more | 2016-12-06 |
| 9359276 | Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition | Yoo-Jeong Choi, Hyo-Young Kwon, Yun-Jun Kim, Young Min Kim, Yong-Woon Yoon +1 more | 2016-06-07 |
| 9312122 | Rinse liquid for insulating film and method of rinsing insulating film | Jin-Hee Bae, Han-Song Lee, Wan-Hee Lim, Go-Un Kim, Taek-Soo Kwak +8 more | 2016-04-12 |
| 9284245 | Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition | Sung Jae Lee, Hwan-Sung Cheon, Chul-Ho Lee, Chung-Heon Lee | 2016-03-15 |
| 9244351 | Composition for hardmask, method of forming patterns using the same, and semiconductor integrated circuit device including the patterns | Sung Jae Lee, Joon-Young Moon, Young Min Kim, Yong-Woon Yoon | 2016-01-26 |
| 9158201 | Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition | Bum Jin Lee, Yun-Jun Kim | 2015-10-13 |
| 8997925 | High temperature resistant sound absorbing materials for vehicle | Keun Young Kim, Bong Hyun Park, Won Jin Seo, Ki-Dong Lee, Su Nam Lee | 2015-04-07 |
| 8952373 | Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns | Yoo-Jeong Choi, Yun-Jun Kim, Joon-Young Moon, Bum Jin Lee, Chung-Heon Lee | 2015-02-10 |
| 8900997 | Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewith | Joon-Young Moon, Sung Jae Lee, You-Jung Park, Yong-Woon Yoon, Chul-Ho Lee +1 more | 2014-12-02 |
| 8017301 | Photosensitive polymer, resist composition, and associated methods | Sang-jun Choi, Seung-Wook SHIN, Hye Won Kim | 2011-09-13 |
| 7993810 | (Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods | Sang-jun Choi, Seung-Wook SHIN, Hye Won Kim | 2011-08-09 |