HK

Hyo-Young Kwon

Samsung: 10 patents #13,191 of 75,807Top 20%
CI Cheil Industries: 8 patents #116 of 975Top 15%
Overall (All Time): #254,322 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
10556986 Polymer, organic layer composition, and method of forming patterns Youjung PARK, Sunyoung YANG 2020-02-11
10392459 Photocurable composition and device including barrier layer formed from composition Ji Hye Kwon, Seong Ryong NAM, Se-Il Oh, Chang Soo Woo, Yeon Soo LEE +3 more 2019-08-27
10364221 Monomer, organic layer composition, organic layer, and method of forming patterns Sunhae KANG, Ran NAMGUNG, Younhee Nam, Yumi Heo, Young Min Kim +1 more 2019-07-30
10340148 Polymer, organic layer composition, and method of forming patterns Ran NAMGUNG, Dominea RATHWELL, Hyeonil JUNG 2019-07-02
10323124 Polymer, organic layer composition, organic layer, and method of forming patterns Youn-Hee Nam, Seung Hyun Kim, Sung Hwan Kim, Ran NAMGUNG, Soo-Hyoun Mun +4 more 2019-06-18
10066057 Organic layer composition, organic layer, and method of forming patterns Yu-Shin Park, Yun-Jun Kim, Tae Ho Kim, You-Jung Park, Yoo-Jeong Choi +7 more 2018-09-04
9971243 Polymer, organic layer composition, organic layer, and method of forming patterns Yu-Shin Park, Tae Ho Kim, Yoo-Jeong Choi, Sun-Hae Kang, Sang Kyun Kim +6 more 2018-05-15
9873815 Polymer, organic layer composition, and method of forming patterns Soohyoun Mun, Ran NAMGUNG, Younhee Nam, Hyunji SONG 2018-01-23
9862668 Monomer, polymer, organic layer composition, organic layer, and method of forming patterns Youn-Hee Nam, Sung Hwan Kim, Seung Hyun Kim, Ran NAMGUNG, Dominea RATHWELL +4 more 2018-01-09
9758612 Polymer, organic layer composition, organic layer, and method of forming patterns Ran NAMGUNG, Seung Hyun Kim, Dominea RATHWELL, Soo-Hyoun Mun, Hyeon-Il Jung +1 more 2017-09-12
9725389 Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition Yun-Jun Kim, Hwan-Sung Cheon, Youn-Jin Cho, Yong-Woon Yoon, Chung-Heon Lee +1 more 2017-08-08
9606438 Resist underlayer composition, method of forming patterns, and semiconductor integrated circuit device including the pattern Min Gyum KIM, Jun Ho Lee, Hwan-Sung Cheon 2017-03-28
9593205 Polymer, organic layer composition, organic layer, and method of forming patterns Soo-Hyoun Mun, Seung Hyun Kim, Ran NAMGUNG, Dominea RATHWELL, Hyeon-Il Jung +1 more 2017-03-14
9556094 Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition Yun-Jun Kim, Hea-Jung Kim, Chung-Heon Lee, Youn-Jin Cho, Yoo-Jeong Choi 2017-01-31
9359276 Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition Yoo-Jeong Choi, Youn-Jin Cho, Yun-Jun Kim, Young Min Kim, Yong-Woon Yoon +1 more 2016-06-07
9329475 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device Ran NAMGUNG, Hwan-Sung Cheon 2016-05-03
9195136 Resist underlayer composition, method of forming patterns and semiconductor integrated circuit device including the patterns Min Gyum KIM, Jun Ho Lee, Hwan-Sung Cheon 2015-11-24
8956790 Positive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the same Jun Ho Lee, Hwan-Sung Cheon 2015-02-17