MK

Masahiro Kanai

Canon: 144 patents #36 of 19,416Top 1%
SE Seiko Epson: 44 patents #256 of 7,774Top 4%
AU Aubex: 2 patents #2 of 14Top 15%
HT Halo Lsi Design & Device Technology: 2 patents #5 of 10Top 50%
MM Mitsubishi Materials: 1 patents #812 of 1,543Top 55%
MC Mitsubishi Materials Electronic Chemicals Co.: 1 patents #21 of 49Top 45%
📍 Akita, TX: #1 of 1 inventorsTop 100%
Overall (All Time): #3,734 of 4,157,543Top 1%
191
Patents All Time

Issued Patents All Time

Showing 51–75 of 191 patents

Patent #TitleCo-InventorsDate
6785182 Nonvolatile semiconductor memory device Teruhiko Kamei 2004-08-31
6755515 Ink cartridge for ink-jet printing apparatus Minoru Usui, Satoshi Shinada, Takahiro Naka, Hisashi Miyazawa, Takeo Seino +8 more 2004-06-29
6744106 Non-volatile semiconductor memory device 2004-06-01
6738291 Nonvolatile semiconductor memory device Teruhiko Kamei 2004-05-18
6720037 Plasma processing method and apparatus Yukito Aota 2004-04-13
6707720 Nonvolatile semiconductor storage device Teruhiko Kamei 2004-03-16
6707742 Nonvolatile semiconductor memory device Teruhiko Kamei 2004-03-16
6667240 Method and apparatus for forming deposited film Hiroyuki Ozaki, Naoto Okada, Koichiro Moriyama, Hiroshi Shimoda 2003-12-23
6654282 Nonvolatile semiconductor memory device 2003-11-25
6638359 Deposited film forming apparatus and deposited film forming method Takahiro Yajima, Takeshi Shishido 2003-10-28
6632284 Apparatus and method for forming deposited film Takeshi Shishido, Yuzo Koda, Takahiro Yajima 2003-10-14
6602347 Apparatus and method for processing a substrate Hiroshi Shimoda, Hirokazu Ohtoshi, Tadashi Hori, Koichiro Moriyama 2003-08-05
6587380 Programming method for non-volatile semiconductor memory device Teruhiko Kamei 2003-07-01
6587381 Programming method for non-volatile semiconductor memory device Teruhiko Kamei 2003-07-01
6576061 Apparatus and method for processing a substrate Koichiro Moriyama, Hirokazu Ohtoshi, Tadashi Hori, Naoto Okada, Hiroshi Shimoda +1 more 2003-06-10
6562400 Method and apparatus for forming deposition film, and method for treating substrate Hideo Tamura, Yasuyoshi Takai, Hiroshi Shimoda, Hidetoshi Tsuzuki 2003-05-13
6551471 Ionization film-forming method and apparatus Hirohito Yamaguchi, Atsushi Koike, Katsunori Oya 2003-04-22
6547922 Vacuum-processing apparatus using a movable cooling plate during processing Tadashi Hori, Koichiro Moriyama, Hiroshi Shimoda, Hiroyuki Ozaki 2003-04-15
6531654 Semiconductor thin-film formation process, and amorphous silicon solar-cell device Shuichiro Sugiyama, Takahiro Yajima 2003-03-11
6530341 Deposition apparatus for manufacturing thin film Yuzo Kohda, Shotaro Okabe, Akira Sakai, Tadashi Hori, Tomonori Nishimoto +1 more 2003-03-11
6526910 Apparatus and method for forming a deposited film by means of plasma CVD Takahiro Yajima, Takeshi Shishido 2003-03-04
6495392 Process for producing a semiconductor device Akira Sakai, Yasushi Fujioka, Shotaro Okabe, Tadashi Sawayama, Yuzo Koda +1 more 2002-12-17
6482668 Process for producing photovoltaic device Naoto Okada, Hirokazu Ohtoshi, Tadashi Hori 2002-11-19
6470823 Apparatus and method for forming a deposited film by a means of plasma CVD Takahiro Yajima, Yuzo Koda, Takeshi Shishido 2002-10-29
6472296 Fabrication of photovoltaic cell by plasma process Yasushi Fujioka, Shotaro Okabe, Akira Sakai, Tadashi Sawayama, Yuzo Koda +1 more 2002-10-29