Issued Patents All Time
Showing 26–50 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6767476 | Polishing composition for metal CMP | Steven Grumbine, Christopher C. Streinz, Eric W. G. Hoglund | 2004-07-27 |
| 6689692 | Composition for oxide CMP | Gautam S. Grover, Brian L. Mueller | 2004-02-10 |
| 6646348 | Silane containing polishing composition for CMP | Steven Grumbine | 2003-11-11 |
| 6592776 | Polishing composition for metal CMP | Steven Grumbine, Christopher C. Streinz, Eric W. G. Hoglund | 2003-07-15 |
| 6582623 | CMP composition containing silane modified abrasive particles | Steven Grumbine, Christopher C. Streinz | 2003-06-24 |
| 6569350 | Chemical mechanical polishing slurry useful for copper substrates | Vlasta Brusic Kaufman, Rodney Kistler | 2003-05-27 |
| 6541434 | Cleaning solution for semiconductor surfaces following chemical-mechanical polishing | — | 2003-04-01 |
| 6471884 | Method for polishing a memory or rigid disk with an amino acid-containing composition | Mingming Fang | 2002-10-29 |
| 6468137 | Method for polishing a memory or rigid disk with an oxidized halide-containing polishing system | Mingming Fang | 2002-10-22 |
| 6447371 | Chemical mechanical polishing slurry useful for copper/tantalum substrates | Vlasta Brusic Kaufman, Rodney Kistler | 2002-09-10 |
| 6435947 | CMP polishing pad including a solid catalyst | Brian L. Mueller | 2002-08-20 |
| 6432828 | Chemical mechanical polishing slurry useful for copper substrates | Vlasta Brusic Kaufman, Rodney Kistler | 2002-08-13 |
| 6395693 | Cleaning solution for semiconductor surfaces following chemical-mechanical polishing | — | 2002-05-28 |
| 6362104 | Method for polishing a substrate using a CMP slurry | Brian L. Mueller | 2002-03-26 |
| 6362106 | Chemical mechanical polishing method useful for copper substrates | Vlasta Brusic Kaufman, Rodney Kistler | 2002-03-26 |
| 6347978 | Composition and method for polishing rigid disks | Mingming Fang, Christopher C. Streinz | 2002-02-19 |
| 6316366 | Method of polishing using multi-oxidizer slurry | Vlasta Brusic Kaufman | 2001-11-13 |
| 6316365 | Chemical-mechanical polishing method | Homer Chou | 2001-11-13 |
| 6309560 | Chemical mechanical polishing slurry useful for copper substrates | Vlasta Brusic Kaufman, Rodney Kistler | 2001-10-30 |
| 6217416 | Chemical mechanical polishing slurry useful for copper/tantalum substrates | Vlasta Brusic Kaufman, Rodney Kistler | 2001-04-17 |
| 6177026 | CMP slurry containing a solid catalyst | Brian L. Mueller | 2001-01-23 |
| 6126853 | Chemical mechanical polishing slurry useful for copper substrates | Vlasta Brusic Kaufman, Rodney Kistler | 2000-10-03 |
| 6063306 | Chemical mechanical polishing slurry useful for copper/tantalum substrate | Vlasta Brusic Kaufman, Rodney Kistler | 2000-05-16 |
| 6039891 | Multi-oxidizer precursor for chemical mechanical polishing | Vlasta Brusic Kaufman | 2000-03-21 |
| 6033596 | Multi-oxidizer slurry for chemical mechanical polishing | Vlasta Brusic Kaufman | 2000-03-07 |