FE

Frank Everts

AB Asml Netherlands B.V.: 8 patents #564 of 3,192Top 20%
CY Cymer: 7 patents #64 of 339Top 20%
Overall (All Time): #552,533 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
11686951 Reducing speckle in an excimer light source Wilhelmus Patrick Elisabeth Maria OP 'T ROOT, Thomas Patrick Duffey, Herman Philip Godfried, Joshua Jon Thornes, Brian Edward King 2023-06-27
11287743 Control system and method Herman Philip Godfried, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT 2022-03-29
11054665 Reducing speckle in an excimer light source Wilhelmus Patrick Elisabeth Maria OP 'T ROOT, Thomas Patrick Duffey, Herman Philip Godfried, Joshua Jon Thornes, Brian Edward King 2021-07-06
11050213 Online calibration for repetition rate dependent performance variables Joshua Jon Thornes, Tanuj Aggarwal, Kevin M. O'Brien, Herman Philip Godfried, Russell Allen Burdt 2021-06-29
10727642 Online calibration for repetition rate dependent performance variables Joshua Jon Thornes, Tanuj Aggarwal, Kevin M. O'Brien, Herman Philip Godfried, Russell Allen Burdt 2020-07-28
10627724 Lithographic apparatus and method Wilhelmus Patrick Elisabeth Maria OP 'T ROOT, Herman Philip Godfried, Joshua Jon Thornes, Kevin M. O'Brien, Leon Pieter Paul Saanen +1 more 2020-04-21
10451890 Reducing speckle in an excimer light source Wilhelmus Patrick Elisabeth Maria OP 'T ROOT, Thomas Patrick Duffey, Herman Philip Godfried, Joshua Jon Thornes, Brian Edward King 2019-10-22
9762023 Online calibration for repetition rate dependent performance variables Joshua Jon Thornes, Tanuj Aggarwal, Kevin M. O'Brien, Herman Philip Godfried, Russell Allen Burdt 2017-09-12
9645510 Method of controlling a radiation source and lithographic apparatus comprising the radiation source Wilhelmus Patrick Elisabeth Maria OP 'T ROOT, Adrianus Leonardus Gertrudus Bommer, Robert De Jong, Herman Philip Godfried, Roland Pieter Stolk +1 more 2017-05-09