Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7749871 | Method for depositing nanolaminate thin films on sensitive surfaces | Kai-Erik Elers, Suvi Haukka, Sari Johanna Kaipio, Pekka Soininen | 2010-07-06 |
| 7670944 | Conformal lining layers for damascene metallization | Ivo Raaijmakers, Suvi Haukka, Pekka Soininen, Kai-Erik Elers, Ernst H. A. Granneman | 2010-03-02 |
| 7485340 | Production of elemental films using a boron-containing reducing agent | Kai-Erik Elers, Sari Johanna Kaipio, Pekka Soininen | 2009-02-03 |
| 7329590 | Method for depositing nanolaminate thin films on sensitive surfaces | Kai-Erik Elers, Suvi Haukka, Sari Johanna Kaipio, Pekka Soininen | 2008-02-12 |
| 7144809 | Production of elemental films using a boron-containing reducing agent | Kai-Erik Elers, Sari Johanna Kaipio, Pekka Soininen | 2006-12-05 |
| 6902763 | Method for depositing nanolaminate thin films on sensitive surfaces | Kai-Erik Elers, Suvi Haukka, Sari Johanna Kaipio, Pekka Soininen | 2005-06-07 |
| 6863727 | Method of depositing transition metal nitride thin films | Kai-Erik Elers, Suvi Haukka, Sari Johanna Kaipio, Pekka Soininen | 2005-03-08 |
| 6852635 | Method for bottomless deposition of barrier layers in integrated circuit metallization schemes | Alessandra Satta, Karen Maex, Kai-Erik Elers, Pekka Soininen, Suvi Haukka | 2005-02-08 |
| 6820570 | Atomic layer deposition reactor | Olli Kilpela, Wei Li, Kai-Erik Elers, Juhana Kostamo, Ivo Raaijmakers +1 more | 2004-11-23 |
| 6821889 | Production of elemental thin films using a boron-containing reducing agent | Kai-Erik Elers, Sari Johanna Kaipio, Pekka Soininen | 2004-11-23 |
| 6800552 | Deposition of transition metal carbides | Kai-Erik Elers, Suvi Haukka, Sari Johanna Kaipio, Pekka Soininen | 2004-10-05 |
| 6794287 | Process for growing metal or metal carbide thin films utilizing boron-containing reducing agents | Kai-Erik Elers, Sari Johanna Kaipio, Pekka Soininen | 2004-09-21 |
| 6727169 | Method of making conformal lining layers for damascene metallization | Ivo Raaijmakers, Suvi Haukka, Pekka Soininen, Kai-Erik Elers, Ernst H. A. Granneman | 2004-04-27 |
| 6664192 | Method for bottomless deposition of barrier layers in integrated circuit metallization schemes | Alessandra Satta, Karen Maex, Kai-Erik Elers, Pekka Soininen, Suvi Haukka | 2003-12-16 |
| 6599572 | Process for growing metalloid thin films utilizing boron-containing reducing agents | Kai-Erik Elers, Sari Johanna Kaipio, Pekka Soininen | 2003-07-29 |
| 6482262 | Deposition of transition metal carbides | Kai-Erik Elers, Suvi Haukka, Sari Johanna Kaipio, Pekka Soininen | 2002-11-19 |
| 6475276 | Production of elemental thin films using a boron-containing reducing agent | Kai-Erik Elers, Sari Johanna Kaipio, Pekka Soininen | 2002-11-05 |
| 6391785 | Method for bottomless deposition of barrier layers in integrated circuit metallization schemes | Alessandra Satta, Karen Maex, Kai-Erik Elers, Pekka Soininen, Suvi Haukka | 2002-05-21 |